Mechanical properties of silicon oxynitride thin films prepared by low energy ion beam assisted deposition

1999 ◽  
Vol 148 (1-4) ◽  
pp. 599-603 ◽  
Author(s):  
Yukari Shima ◽  
Hiroki Hasuyama ◽  
Toshiharu Kondoh ◽  
Yasuo Imaoka ◽  
Takanori Watari ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Ion Beam ◽  
Silicon Oxynitride ◽  
Low Energy ◽  
Ion Beam Assisted Deposition

Low-energy ion beam-assisted deposition of giant magnetoresistive thin films

1996 ◽  
Vol 79 (8) ◽  
pp. 4939
Author(s):  
S. J. Guilfoyle ◽  
R. J. Pollard ◽  
P. J. Grundy
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Low Energy ◽  
Ion Beam Assisted Deposition

Low grain size TiN thin films obtained by low energy ion beam assisted deposition

2001 ◽  
Vol 173 (3-4) ◽  
pp. 290-295 ◽  
Author(s):  
J.M. López ◽  
F.J. Gordillo-Vázquez ◽  
O. Böhme ◽  
J.M. Albella
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Ion Beam ◽  
Low Energy ◽  
Ion Beam Assisted Deposition ◽  
Tin Thin Films

Preparation of carbon nitride thin films by ion beam assisted deposition and their mechanical properties

1997 ◽  
Vol 308-309 ◽  
pp. 239-244 ◽  
Author(s):  
M Kohzaki ◽  
A Matsumuro ◽  
T Hayashi ◽  
M Muramatsu ◽  
K Yamaguchi
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition

Mechanical Properties of AlN Thin Films Prepared by Ion Beam Assisted Deposition

2000 ◽  
Vol 647 ◽  
Author(s):  
Shuichi Miyabe ◽  
Toshiyuki Okawa ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe ◽  
Yoshikazu Nakamura
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Residual Stress ◽  
Beam Energy ◽  
Ion Beam ◽  
High Energy ◽  
Columnar Structure ◽  
Ion Beam Assisted Deposition ◽  
Film Hardness ◽  
Nitrogen Ion

AbstractAluminum nitride (AlN) thin films were prepared by ion-beam assisted deposition method, and the influence of the nitrogen ion beam energy on their microstructure and mechanical properties was studied by changing the ion beam energy from 0.1 to 1.5 keV. Films prepared with a low-energy ion beam show a columnar structure, while films prepared with a high-energy ion beam show a granular structure. The film hardness is found to decrease with increasing nitrogen ion beam energy. It is also found that the film hardness does not change drastically after annealing in nitrogen atmosphere at 500 °C, yielding the residual stress relaxation. It is proposed that the film hardness is dependent on the film microstructure, which can be controlled with the nitrogen ion beam energy, rather than the residual stress in the films.

Ductility Enhancement and Mechanical Properties of Ibad Ceramic thin films

1990 ◽  
Vol 201 ◽  
Author(s):  
J. K. Hirvonen ◽  
T. G. Tetreault ◽  
G. Parker ◽  
C. J. McHargue
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Low Temperature ◽  
Ion Beam ◽  
Grain Structure ◽  
Fine Grained ◽  
Ceramic Thin Films ◽  
Ion Beam Assisted Deposition ◽  
Ceramic Films

AbstractThin ceramic films (A12O3 ZrO2, Si3N4, and BN) have been prepared by ion beam assisted deposition (IBAD) and their mechanical properties examined. The films exhibit extreme ductility and adhesion, with the former property possibly attributed to the very fine grained, quasi-amorphous grain structure noted for low temperature IBAD coatings.

Low energy ion beam assisted deposition of TiN thin films on silicon

2000 ◽  
Vol 42 (6) ◽  
pp. 573-579 ◽  
Author(s):  
J.-H Huang ◽  
C.-H Lin ◽  
C.-H Ma ◽  
Haydn Chen
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Low Energy ◽  
Ion Beam Assisted Deposition ◽  
Tin Thin Films

Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

2016 ◽  
Vol 185 ◽  
pp. 295-298 ◽  
Author(s):  
Lin-Ao Zhang ◽  
Hao-Nan Liu ◽  
Xiao-Xia Suo ◽  
Shuo Tong ◽  
Ying-Lan Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition
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