TEM characterization of the microstructure of a tungsten heavy alloy

2003 ◽  
Vol 81 (2-3) ◽  
pp. 469-471 ◽  
Author(s):  
E. Fortuna ◽  
W. Zielinski ◽  
K. Sikorski ◽  
K.J. Kurzydlowski
2020 ◽  
Author(s):  
James IV ◽  
Danny J. Edwards ◽  
Charles H. Henager Jr. ◽  
Wahyu Setyawan ◽  
Jing Wang ◽  
...  

2014 ◽  
Vol 490-491 ◽  
pp. 198-202
Author(s):  
Yu Chen ◽  
Yang Yu ◽  
Wen Cong Zhan ◽  
Er De Wang

The microscopic analysis of 93W-4.9Ni-2.1Fe (wt. %) tungsten heavy alloy by hot-hydrostatic extrusion with severe plastic deformation strengthening were experimentally investigated mainly by transmission electron microscopy. Due to the profound differences in hardness of the tungsten particles and the NiFeW matrix a special TEM specimen preparation method had to be employed.It was shown that the microstructure of the as-extruded alloy was characterized by elongated tungsten particles with refinement cellular sub-structures consisting of high-density dislocations embedded in a binding Ni-Fe-W matrix phase with fine dynamically re-crystallized grains.


2021 ◽  
Vol 204 ◽  
pp. 116523
Author(s):  
James V. Haag ◽  
Danny J. Edwards ◽  
Charles H. Henager ◽  
Wahyu Setyawan ◽  
Jing Wang ◽  
...  

Author(s):  
W. E. Lee

An optical waveguide consists of a several-micron wide channel with a slightly different index of refraction than the host substrate; light can be trapped in the channel by total internal reflection.Optical waveguides can be formed from single-crystal LiNbO3 using the proton exhange technique. In this technique, polished specimens are masked with polycrystal1ine chromium in such a way as to leave 3-13 μm wide channels. These are held in benzoic acid at 249°C for 5 minutes allowing protons to exchange for lithium ions within the channels causing an increase in the refractive index of the channel and creating the waveguide. Unfortunately, optical measurements often reveal a loss in waveguiding ability up to several weeks after exchange.


Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.


2019 ◽  
Vol 61 (3) ◽  
pp. 209-212
Author(s):  
Ramachandran Damodaram ◽  
Gangaraju Manogna Karthik ◽  
Sree Vardhan Lalam

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