Structural investigation and wear resistance of submicron TiN coatings obtained by a hybrid plasma immersion ion implantation process

2001 ◽  
Vol 142-144 ◽  
pp. 978-983 ◽  
Author(s):  
R. Günzel ◽  
N. Shevshenko ◽  
W. Matz ◽  
A. Mücklich ◽  
J.P. Celis
Keyword(s):  
Wear Resistance ◽  
Ion Implantation ◽  
Structural Investigation ◽  
Tin Coatings ◽  
Hybrid Plasma ◽  
Implantation Process ◽  
Plasma Immersion Ion Implantation

scholarly journals Effects of high temperature plasma immersion ion implantation on wear resistance of Ti-Si-B sintered alloys

2013 ◽  
Vol 228 ◽  
pp. 195-200 ◽  
Author(s):  
Bruno Bacci Fernandes ◽  
Rogério Moraes Oliveira ◽  
Mário Ueda ◽  
Samantha de Fátima Magalhães Mariano ◽  
Alfeu Saraiva Ramos ◽  
...  
Keyword(s):  
Wear Resistance ◽  
High Temperature ◽  
Ion Implantation ◽  
Temperature Plasma ◽  
High Temperature Plasma ◽  
Plasma Immersion Ion Implantation ◽  
Sintered Alloys

Optimization of a plasma immersion ion implantation process for shallow junctions in silicon

2014 ◽  
Vol 32 (6) ◽  
pp. 061302 ◽  
Author(s):  
Ashok Ray ◽  
Rajashree Nori ◽  
Piyush Bhatt ◽  
Saurabh Lodha ◽  
Richard Pinto ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Shallow Junctions ◽  
Implantation Process ◽  
Plasma Immersion Ion Implantation

Substrate Bias Effects on the Structure of the Film by a Hybrid PVD and Plasma-Based Ion Implantation Process

2005 ◽  
Vol 486-487 ◽  
pp. 452-455
Author(s):  
S.Y. Chun ◽  
Sang Jin Lee
Keyword(s):  
Surface Morphology ◽  
Ion Implantation ◽  
Grain Structure ◽  
Gold Films ◽  
Substrate Bias ◽  
Continuous Film ◽  
Negative Voltage ◽  
Morphology And Structure ◽  
Hybrid Plasma ◽  
Implantation Process

This paper descirbes the characteristics of gold films prepared by a hybrid plasma based an ion implantation/deposition (PBIID) system. The surface morphology and structure of the film were affected by the voltage applied to the target. With increasing negative voltage, the surface became thinner with a lesser number of nuclei. The grain structure varied from the continuous film at 0 kV to the channel at -1 kV, and further to the islands (mounds) at -5 kV. The ions in the sheath are believed to play an important role in the deposition of the film.

FDTD study of the effects of the doubly ionized ions on the plasma immersion ion implantation process

2014 ◽  
Vol 80 (2) ◽  
pp. 215-223
Author(s):  
M. Sharifian ◽  
Y. Sadeghi
Keyword(s):  
Ion Implantation ◽  
Plasma Polymerization ◽  
Potential Distribution ◽  
Density Ratio ◽  
Plasma Sheath ◽  
Sheath Region ◽  
Implantation Process ◽  
Plasma Immersion Ion Implantation

AbstractThe plasma sheath dynamics adjacent to the cathode in the presence of electrons, ions, and doubly ionized ions have been simulated in this work. The aim of the present investigation is, therefore, to study the effect of the doubly ionized ions on the characteristics of the plasma sheath dynamics such as potential distribution, sheath length, and ions dose and velocity near the surface (cathode). It was shown that the presence of the doubly ionized ions can increase the normalized potential of all positions in sheath region, sheath length, and ion/doubly ionized ions density ratio on the target. Obtained results may be helpful for analyzing the practical results of the surface operations such as ion implantation and plasma polymerization, etc.

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