Substrate Bias Effects on the Structure of the Film by a Hybrid PVD and Plasma-Based Ion Implantation Process
2005 ◽
Vol 486-487
◽
pp. 452-455
Keyword(s):
This paper descirbes the characteristics of gold films prepared by a hybrid plasma based an ion implantation/deposition (PBIID) system. The surface morphology and structure of the film were affected by the voltage applied to the target. With increasing negative voltage, the surface became thinner with a lesser number of nuclei. The grain structure varied from the continuous film at 0 kV to the channel at -1 kV, and further to the islands (mounds) at -5 kV. The ions in the sheath are believed to play an important role in the deposition of the film.
2001 ◽
Vol 142-144
◽
pp. 978-983
◽
Keyword(s):
1980 ◽
Vol 1
(6)
◽
pp. 112-114
◽
2001 ◽
Vol 148
(12)
◽
pp. G704
◽
Keyword(s):
Keyword(s):