Reactive magnetron sputtering deposition of TiN films. I. Influence of the substrate temperature on structure, composition and morphology of the films

1997 ◽  
Vol 88 (1-3) ◽  
pp. 17-27 ◽  
Author(s):  
Laurette Combadiere ◽  
Jean Machet
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Sputtering Deposition ◽  
Tin Films

Performance improvement of TiO2/CuO by increasing oxygen flow rates and substrate temperature using DC reactive magnetron sputtering method

Optik ◽  
2020 ◽  
Vol 206 ◽  
pp. 164297
Author(s):  
Paulina Sawicka-Chudy ◽  
Grzegorz Wisz ◽  
Maciej Sibiński ◽  
Zbigniew Starowicz ◽  
Łukasz Głowa ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Performance Improvement ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Reactive Magnetron ◽  
Flow Rates ◽  
Dc Reactive Magnetron Sputtering

Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure

2016 ◽  
Vol 37 (3) ◽  
pp. 289-292 ◽  
Author(s):  
M. V. Ermolenko ◽  
S. M. Zavadski ◽  
D. A. Golosov ◽  
S. N. Melnikov ◽  
E. G. Zamburg
Keyword(s):  
Magnetron Sputtering ◽  
Tribological Behavior ◽  
Low Pressure ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tin Films

Deposition of thin TiN films by low-power reactive magnetron sputtering

1997 ◽  
Author(s):  
P.V. Mikhalchuk ◽  
A.A. Orlikovsky ◽  
A.G. Vasiliev ◽  
O.I. Lebedev ◽  
D.N. Zakharov
Keyword(s):  
Magnetron Sputtering ◽  
Low Power ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tin Films
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