Performance improvement of TiO2/CuO by increasing oxygen flow rates and substrate temperature using DC reactive magnetron sputtering method

Optik ◽  
2020 ◽  
Vol 206 ◽  
pp. 164297
Author(s):  
Paulina Sawicka-Chudy ◽  
Grzegorz Wisz ◽  
Maciej Sibiński ◽  
Zbigniew Starowicz ◽  
Łukasz Głowa ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Performance Improvement ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Reactive Magnetron ◽  
Flow Rates ◽  
Dc Reactive Magnetron Sputtering

PROPERTIES OF Ta2O5 THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

2009 ◽  
Vol 23 (27) ◽  
pp. 5275-5282 ◽  
Author(s):  
JICHENG ZHOU ◽  
DITIAN LUO ◽  
YOUZHEN LI ◽  
ZHENG LIU
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Surface Characteristics ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Root Mean Square Roughness ◽  
Reactive Magnetron ◽  
Flow Ratio ◽  
Dc Reactive Magnetron Sputtering ◽  
Xrd Patterns

Ta 2 O 5 thin films were deposited at different oxygen flow ratio ( O 2/( O 2+Ar) = 10 ~ 80%) by DC reactive magnetron sputtering. Influence of oxygen flow ratio on depositing rate, surface characteristics, microstructure, and optical properties are discussed in this paper. With the increasing of oxygen, deposition rate decreases exponentially, the root mean square roughness and the maximum roughness decrease according to the atom force microscope images. XRD patterns indicate the as-deposited Ta 2 O 5 films are amorphous. Based on the envelop method, the samples' optical constants are calculated from the curve of transmission spectrum. The results indicate that refractive index n increases from 2.01 to 2.20 (λ = 500 nm ) for the oxygen flow ratio increases from 20% to 60%, the extinction coefficient k appears to decrease.

Influence of nitrogen flow rates on iron nitride thin films prepared by DC reactive magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6173-6177 ◽  
Author(s):  
K. Jantasom ◽  
M. Horprathum ◽  
P. Eiamchai ◽  
S. Limwichean ◽  
N. Nuntawong ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Iron Nitride ◽  
Reactive Magnetron ◽  
Nitrogen Flow ◽  
Flow Rates ◽  
Dc Reactive Magnetron Sputtering

Influence of Substrate Temperature on the Properties of Al-Doped Zinc Oxide Films Prepared by DC Reactive Magnetron Sputtering

2011 ◽  
Vol 239-242 ◽  
pp. 1626-1632 ◽  
Author(s):  
Chang Hu Yang ◽  
Zhong Quan Ma
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Hall Effect Measurement ◽  
Blue Shift ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering ◽  
Influence Of Substrate ◽  
Rate Of Decline

Transparent and conductive c-axis oriented aluminum-doped zinc oxide (AZO) films have been prepared on glass substrate by dc reactive magnetron sputtering process. The structural, optical and electrical properties of the films were characterized by scanning electron microscope (SEM), X-ray diffraction (XRD), UV-Visible spectrophotometer and Hall effect measurement system. As the substrate temperature increased, the results showed that grain size of the AZO films gradually increased, the films had a strong c-axis oriented and the crystallization of films became better. The absorption edge first shows a red shift, and then switches to the blue shift with increasing substrate temperature. Optical band gap of AZO films first decreases and then increases with increasing substrate temperature. Resistivity of AZO films decreases with increasing substrate temperature but the rate of decline of resistivity becomes slow after substrate temperature reaches 250 °C. The carriers concentration of AZO films increases with substrate temperature increase.

Deposition of Transparent Niobium Oxide Thin Film by DC Reactive Magnetron Sputtering

2016 ◽  
Vol 675-676 ◽  
pp. 217-220
Author(s):  
Narong Sangwaranatee ◽  
Mati Horprathum ◽  
Jakrapong Kaewkhao
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Flow Rate ◽  
Niobium Oxide ◽  
Oxygen Flow Rate ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Transparent niobium oxide thin films were prepared by dc reactive magnetron sputtering under different oxygen flow rate. The niobium oxide thin films have been deposited on silicon wafer and glass substrate from a 99.99% pure niobium target at room temperature. The films were characterized to obtain the relationship between oxygen flow rate and deposition rate, structural, morphology and optical. The result show that the deposition rate decreased with increasing the oxygen flow rate. However, the transmittance spectrum percentage increases with increasing the oxygen flow rate.

Investigation on the Structure and Properties of TiAlN Coatings Deposited by DC Reactive Magnetron Sputtering

2010 ◽  
Vol 154-155 ◽  
pp. 1639-1642
Author(s):  
Xuan Wang ◽  
Kui Zhang ◽  
Guang Hui Yue ◽  
Dong Liang Peng ◽  
Zheng Bing Qi ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Tial Alloy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Compact Structure ◽  
Flow Rates ◽  
Dc Power ◽  
Dc Reactive Magnetron Sputtering ◽  
Alloy Target ◽  
N2 Flow Rate

TiAlN coatings have been deposited by reactive magnetron sputtering from TiAl alloy target using a direct current (DC) power source. The crystal structure, chemical composition, surface morphology and hardness of TiAlN coatings which were prepared at various N2 flow rates have been systemically investigated. The results show a strong effect of N2 flow rates on the orientation, grain size and densification in TiAlN coatings. The TiAlN coating shows the highest hardness at a certain N2 flow rate when it has the most compact structure.

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