The effects of texture height and thickness of amorphous carbon nitride coating of a hard disk slider on the friction and wear of the slider against a disk

This study aimed to understand the influence of small amount of Zr doping of amorphous carbonitride (a-CN) coatings on the structure, and mechanical and tribological behavior. The coatings were prepared using a four-target close-field unbalance magnetron sputtering system; two graphite, one Ti and one Zr targets were used. GDOS, SEM, XRD and XPS were used. A surface profilometer, a nanohardness tester, and a pin-on-disk wear tester were used. It was found the Zr doping resulting in the formation of ZrC and ZrN phases within the coating and the increase in the sp3 bonding fraction. The nanohardness was increased and the wear performance was largely improved.

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Amorphous Carbon Nitride with Three Coordinate Nitrogen (N3 C ) Vacancies for Exceptional NO x Abatement in Visible Light

Advanced Energy Materials ◽

10.1002/aenm.202004001 ◽

2021 ◽

pp. 2004001

Author(s):

Youyu Duan ◽

Yang Wang ◽

Liyong Gan ◽

Jiazhi Meng ◽

Yajie Feng ◽

...

Keyword(s):

Visible Light ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Amorphous Carbon Nitride

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Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(01)01264-0 ◽

2001 ◽

Vol 395 (1-2) ◽

pp. 249-252 ◽

Cited By ~ 9

Author(s):

Haruo Yokomichi ◽

Atsushi Masuda ◽

Naoki Kishimoto

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Hot Wire ◽

Amorphous Carbon Nitride

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Structural Characterization of Amorphous Carbon Nitride Thin Films Prepared by Pulsed Laser Deposition

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.206-213.531 ◽

2001 ◽

Vol 206-213 ◽

pp. 531-534

Author(s):

Yoshifumi Aoi ◽

Kunio Sakurada ◽

Kojiro Ono ◽

Eiji Kamijo

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Amorphous Carbon ◽

Structural Characterization ◽

Carbon Nitride ◽

Pulsed Laser ◽

Laser Deposition ◽

Amorphous Carbon Nitride

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X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES ON THE BONDING PROPERTIES OF AMORPHOUS CARBON NITRIDE FILMS SYNTHESIZED BY PULSED LASER DEPOSITION WITH DIFFERENT SUBSTRATE TEMPERATURES

Surface Review and Letters ◽

10.1142/s0218625x05006949 ◽

2005 ◽

Vol 12 (02) ◽

pp. 185-195

Author(s):

M. RUSOP ◽

T. SOGA ◽

T. JIMBO

Keyword(s):

Pulsed Laser Deposition ◽

Amorphous Carbon ◽

Photoelectron Spectroscopy ◽

Carbon Nitride ◽

Measurement Techniques ◽

Pulsed Laser ◽

Laser Deposition ◽

X Ray ◽

Amorphous Carbon Nitride ◽

Substrate Temperatures

Amorphous carbon nitride films ( a-CN x) were deposited by pulsed laser deposition of camphoric carbon target with different substrate temperatures (ST). The influence of ST on the synthesis of a-CN x films was investigated. The nitrogen-to-carbon (N/C) and oxygen-to-carbon (O/C) atomic ratios, bonding state, and microstructure of the deposited a-CN x films were characterized by X-ray photoelectron spectroscopy and were confirmed by other standard measurement techniques. The bonding states between C and N , and C and O in the deposited films were found to be significantly influenced by ST during the deposition process. The N/C and O/C atomic ratios of the a-CN x films reached the maximum value at 400°C. ST of 400°C was proposed to promote the desired sp 3-hybridized C and the C 3 N 4 phase. The C–N bonding of C–N , C=N and C≡N were observed in the films.

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