Characterization of hydrogenated amorphous carbon nitride particles and coatings obtained in a CH4/N2 radiofrequency discharge

Radiofrequency Discharge ◽

Contribution of CN(X2Σ+) radicals to N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of the gas mixture of N2 and CH3CN

Diamond and Related Materials ◽

10.1016/j.diamond.2015.10.029 ◽

2016 ◽

Vol 63 ◽

pp. 125-131

Author(s):

Haruhiko Ito ◽

Nobuyoshi Mogi ◽

Kohtaro Okada ◽

Hiroki Tsudome

Keyword(s):

Amorphous Carbon ◽

Carbon Nitride ◽

Microwave Discharge ◽

Gas Mixture ◽

Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas

Applied Surface Science ◽

10.1016/j.apsusc.2010.04.106 ◽

2010 ◽

Vol 256 (22) ◽

pp. 6887-6892 ◽

Cited By ~ 12

Author(s):

Jinhai Niu ◽

Lianlian Zhang ◽

Zhihui Zhang ◽

Dongping Liu ◽

Yanhong Liu ◽

...

Keyword(s):

Dielectric Barrier Discharge ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Barrier Discharge ◽

Dielectric Barrier ◽

Discharge Plasmas ◽

Structural analysis of hydrogenated amorphous carbon nitride films formed from the decomposition of CH3CN in the microwave discharge flow of Ar

Japanese Journal of Applied Physics ◽

10.7567/1347-4065/ab19a2 ◽

2019 ◽

Vol 58 (SE) ◽

pp. SEED02

Author(s):

Haruhiko Ito ◽

Chitose Sekizaki ◽

Sho Fukuhara ◽

Hidetoshi Saitoh

Keyword(s):

Structural Analysis ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Microwave Discharge ◽

Discharge Flow ◽

Photoluminescence of hydrogenated amorphous carbon nitride films after ultraviolet light irradiation and thermal annealing

Journal of Applied Physics ◽

10.1063/1.371468 ◽

1999 ◽

Vol 86 (9) ◽

pp. 4971-4977 ◽

Cited By ~ 33

Author(s):

Mei Zhang ◽

Yoshikazu Nakayama ◽

Susumu Harada

Keyword(s):

Thermal Annealing ◽

Ultraviolet Light ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Light Irradiation ◽

Ultraviolet Light Irradiation ◽

Dependence of Radio Frequency Power on Optical, Chemical Bonding and Photoluminescence Properties of Hydrogenated Amorphous Carbon Nitride Films

2006 IEEE International Conference on Semiconductor Electronics ◽

10.1109/smelec.2006.380743 ◽

2006 ◽

Cited By ~ 1

Author(s):

Richard Ritikos ◽

Goh Boon Tong ◽

Rozidawati Awang ◽

Siti Meriam Abdul Gani ◽

Saadah Abdul Rahman

Keyword(s):

Radio Frequency ◽

Amorphous Carbon ◽

Chemical Bonding ◽

Carbon Nitride ◽

Radio Frequency Power ◽

Photoluminescence Properties ◽

Hydrogenated Amorphous ◽

Frequency Power

Structural modifications of hydrogenated amorphous carbon nitride due to ultraviolet light irradiation and thermal annealing

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(99)00849-2 ◽

2000 ◽

Vol 266-269 ◽

pp. 815-820 ◽

Cited By ~ 6

Author(s):

Mei Zhang ◽

Lujun Pan ◽

Yoshikazu Nakayama

Keyword(s):

Thermal Annealing ◽

Ultraviolet Light ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Light Irradiation ◽

Structural Modifications ◽

Ultraviolet Light Irradiation ◽

Raman and infrared modes of hydrogenated amorphous carbon nitride

Journal of Applied Physics ◽

10.1063/1.1365076 ◽

2001 ◽

Vol 89 (10) ◽

pp. 5425-5430 ◽

Cited By ~ 157

Author(s):

S. E. Rodil ◽

A. C. Ferrari ◽

J. Robertson ◽

W. I. Milne

Keyword(s):

Amorphous Carbon ◽

Carbon Nitride ◽

Effect of C2H4/N2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H)

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-010-9214-y ◽

2010 ◽

Vol 30 (2) ◽

pp. 213-239 ◽

Cited By ~ 17

Author(s):

Christian Sarra-Bournet ◽

Nicolas Gherardi ◽

Hervé Glénat ◽

Gaétan Laroche ◽

Francoise Massines

Keyword(s):

Dielectric Barrier Discharge ◽

Amorphous Carbon ◽

Atmospheric Pressure ◽

Carbon Nitride ◽

Barrier Discharge ◽

Plasma Deposition ◽

Dielectric Barrier ◽

Limitation of Nitrogen Incorporation into the Hydrogenated Amorphous Carbon Nitride Films Formed from the Dissociative Excitation Reaction of CH3CN

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.332 ◽

2001 ◽

Vol 40 (Part 1, No. 1) ◽

pp. 332-337 ◽

Cited By ~ 15

Author(s):

Haruhiko Ito ◽

Noriko Ito ◽

Tsutomu Takahashi ◽

Daisuke Tanaka ◽

Hirosuke Takamatsu ◽

...

Keyword(s):

Amorphous Carbon ◽

Carbon Nitride ◽

Dissociative Excitation ◽

Nitrogen Incorporation ◽

Hydrogenated amorphous carbon nitride films on Si(100) deposited by direct current saddle-field plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581919 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2607-2611 ◽

Cited By ~ 5

Author(s):

H. K. Jang ◽

G. Kim ◽

Y. S. Lee ◽

S. W. Whangbo ◽

C. N. Whang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Direct Current ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽