Large area deposition of 〈100〉-textured diamond films by a 60-kW microwave plasma CVD reactor

2002 ◽  
Vol 11 (3-6) ◽  
pp. 596-600 ◽  
Author(s):  
Yutaka Ando ◽  
Yoshihiro Yokota ◽  
Takeshi Tachibana ◽  
Akihiko Watanabe ◽  
Yoshiki Nishibayashi ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Cvd ◽  
Large Area ◽  
Microwave Plasma Cvd ◽  
Area Deposition

Deposition of large area uniform diamond films by microwave plasma CVD

Vacuum ◽  
2018 ◽  
Vol 147 ◽  
pp. 134-142 ◽  
Author(s):  
J. Weng ◽  
F. Liu ◽  
L.W. Xiong ◽  
J.H. Wang ◽  
Q. Sun
Keyword(s):  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Cvd ◽  
Large Area ◽  
Microwave Plasma Cvd

Large Area Deposition of Polycrystalline Diamond Coatings by Microwave Plasma CVD

2013 ◽  
Vol 72 (4) ◽  
pp. 225-232 ◽  
Author(s):  
Awadesh K. Mallik ◽  
Sandip Bysakh ◽  
Kalyan S. Pal ◽  
Nandadulal Dandapat ◽  
Bichitra K. Guha ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Polycrystalline Diamond ◽  
Diamond Coatings ◽  
Plasma Cvd ◽  
Large Area ◽  
Microwave Plasma Cvd ◽  
Area Deposition

scholarly journals Large area microwave plasma CVD of diamond using composite right/left-handed materials

2021 ◽  
Vol 116 ◽  
pp. 108394
Author(s):  
Justas Zalieckas ◽  
Paulius Pobedinskas ◽  
Martin Møller Greve ◽  
Kristoffer Eikehaug ◽  
Ken Haenen ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Plasma Cvd ◽  
Large Area ◽  
Left Handed ◽  
Microwave Plasma Cvd

High-speed synthesis of heavily boron-doped diamond films by in-liquid microwave plasma CVD

2019 ◽  
Vol 92 ◽  
pp. 41-46 ◽  
Author(s):  
Yohei Harada ◽  
Ryota Hishinuma ◽  
Nicolae Spătaru ◽  
Yusei Sakurai ◽  
Kazuya Miyasaka ◽  
...  
Keyword(s):  
High Speed ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Cvd ◽  
Boron Doped Diamond ◽  
Boron Doped ◽  
Microwave Plasma Cvd

Thermal Conductivity of Diamond Films Synthesized by Microwave Plasma CVD

1986 ◽  
Vol 25 (Part 2, No. 10) ◽  
pp. L808-L810 ◽  
Author(s):  
Akira Ono ◽  
Tetsuya Baba ◽  
Hiroyuki Funamoto ◽  
Akira Nishikawa
Keyword(s):  
Thermal Conductivity ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

Deposition of large-area, high-quality cubic boron nitride films by ECR-enhanced microwave-plasma CVD

2003 ◽  
Vol 76 (6) ◽  
pp. 953-955 ◽  
Author(s):  
W.J. Zhang ◽  
C.Y. Chan ◽  
K.M. Chan ◽  
I. Bello ◽  
Y. Lifshitz ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Microwave Plasma ◽  
Cubic Boron Nitride ◽  
Plasma Cvd ◽  
Large Area ◽  
High Quality ◽  
Microwave Plasma Cvd ◽  
Boron Nitride Films

Electrical Contacts to Polycrystalline B Doped Diamond Films

1989 ◽  
Vol 162 ◽  
Author(s):  
K. Nishimura ◽  
K. Das ◽  
M. Iwase ◽  
J. T. Glass ◽  
K. Kobashi
Keyword(s):  
Carrier Concentration ◽  
Room Temperature ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Electrical Contacts ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Order Of Magnitude

ABSTRACTB doped diamond films were synthesized by microwave plasma CVD and electrical contacts were fabricated by R F sputtering. Rc was obtained for Pt, Ni, TaSi2, and Al asdeposited contacts at room temperature. Pt gave the minimum Rc and Al gave the maximum Rc of the metals investigated on films containing a carrier concentration of 5 × 1018/cm3. The minimum Rc, 8.6 × 10−4 Ω cm 2, was obtained on heavily B doped diamond films with a carrier concentration of 2.7 × 1020/cm3. After nnealing at 400 °C, the Rc of Pt contacts on B doped diamond films with a resistivity of 2×104 Ω1 cm decreased by approximately one order of magnitude.

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