Transmission Electron Microscopic Investigation of Pt-Si Thin Films
1969 ◽
Vol 27
◽
pp. 120-121
Keyword(s):
Recently, studies of platinum-silicon ohmic contacts in semiconductor device metallurgy have prompted us to make an investigation into the nature of the reaction between silicon and platinum. We confined ourselves to Pt deposition temperatures, annealing temperatures, and thicknesses that were germane to the production of ohmic contacts.Transmission electron microscopy, selected area electron diffraction, and reflection electron diffraction analysis, coordinated with x-ray diffraction studies, were performed and allowed us to make the following observations.
1989 ◽
Vol 47
◽
pp. 358-359
2000 ◽
Vol 39
(5-6)
◽
pp. 701-710
◽
2004 ◽
Vol 51
(5)
◽
pp. 417-421
◽
2000 ◽
Vol 15
(10)
◽
pp. 2125-2130
◽
1972 ◽
Vol 36
(11)
◽
pp. 1057-1063
◽
1996 ◽
Vol 54
◽
pp. 764-765