scholarly journals Introduction: The Otto Scherzer Special Issue on Aberration-Corrected Electron Microscopy

2010 ◽  
Vol 16 (4) ◽  
pp. 365-365 ◽  
Author(s):  
David J. Smith ◽  
Uli Dahmen
Keyword(s):  
Electron Microscopy ◽  
Historical Context ◽  
Aberration Correction ◽  
Special Issue ◽  
Memorial Symposium ◽  
Recent Emergence ◽  
Rotationally Symmetric ◽  
Chromatic Aberrations ◽  
Poster Presentations ◽  
Aberration Corrected

The year 2009 marked the centenary of the birth of Otto Scherzer, one of the early pioneers of electron microscopy. Scherzer was the originator of the famous microscopy theorem that the spherical and chromatic aberrations of rotationally symmetric electron lenses were unavoidable. In honor of this centennial occasion, we organized a special memorial symposium during Microscopy & Microanalysis 2009, which was held in Richmond, Virginia, in late July. The introductory talks of the symposium presented a fascinating mix of first-hand accounts about working with Scherzer in Darmstadt and descriptions of the correction concepts and the early corrector prototypes that emerged from his group. Placed in this historical context, the latest advances in aberration correction for scanning and fixed-beam instruments that were presented in this symposium were all the more impressive and conveyed a vivid sense of history in the making. Applications of aberration correction to a broad range of materials were also highlighted in platform and poster presentations. This special issue of Microscopy and Microanalysis contains refereed contributions from the work presented at the symposium and thus provides a representative overview of the recent emergence of aberration-corrected electron microscopy (ACEM) and some of the prospects and challenges for this burgeoning field.

The Otto Scherzer Memorial Symposium on Aberration-Corrected Electron Microscopy

2009 ◽  
Vol 17 (5) ◽  
pp. 10-13
Author(s):  
David J. Smith ◽  
Uli Dahmen
Keyword(s):  
Electron Microscopy ◽  
Historical Context ◽  
Aberration Correction ◽  
Short Account ◽  
Memorial Symposium ◽  
Rotationally Symmetric ◽  
Chromatic Aberrations ◽  
Poster Presentations ◽  
Fixed Beam ◽  
Aberration Corrected

The year 2009 marks the centenary of the birth of Otto Scherzer, one of the early pioneers of electron microscopy. Scherzer, shown in Figure 1, was the originator of the famous microscopy theorem that the spherical and chromatic aberrations of rotationally symmetric electron lenses were unavoidable [1]. In honor of this centennial occasion, we organized a special memorial symposium during the Microscopy & Microanalysis 2009 meeting, which was held in Richmond, Virginia, in late July. The introductory talks of the symposium presented a fascinating mix of firsthand accounts about working with Scherzer in Darmstadt and descriptions of the correction concepts and the early corrector prototypes that emerged from his group. Placed in this historical context, the latest advances in aberration correction for scanning and fixed-beam instruments that were presented in this symposium were all the more impressive and conveyed a vivid sense of history in the making. Representative applications of aberration correction to a broad range of materials were also highlighted in platform and poster presentations. Here we give a short account of the emergence of aberration-corrected electron microscopy (ACEM) and very briefly summarize some of the prospects and challenges for this burgeoning field. Further information about these developments, including details of applications, will be found in selected papers from the symposium, which will be published in a forthcoming issue of the journal Microscopy and Microanalysis due to appear in mid-2010.

Development of Aberration-Corrected Electron Microscopy

2008 ◽  
Vol 14 (1) ◽  
pp. 2-15 ◽  
Author(s):  
David J. Smith
Keyword(s):  
Electron Microscopy ◽  
Spherical Aberration ◽  
Materials Characterization ◽  
Electron Holography ◽  
Aberration Correction ◽  
Future Prospects ◽  
Microscopy Image ◽  
Recent Developments ◽  
Fixed Beam ◽  
Aberration Corrected

The successful correction of spherical aberration is an exciting and revolutionary development for the whole field of electron microscopy. Image interpretability can be extended out to sub-Ångstrom levels, thereby creating many novel opportunities for materials characterization. Correction of lens aberrations involves either direct (online) hardware attachments in fixed-beam or scanning TEM or indirect (off-line) software processing using either off-axis electron holography or focal-series reconstruction. This review traces some of the important steps along the path to realizing aberration correction, including early attempts with hardware correctors, the development of online microscope control, and methods for accurate measurement of aberrations. Recent developments and some initial applications of aberration-corrected electron microscopy using these different approaches are surveyed. Finally, future prospects and problems are briefly discussed.

Pre-Meeting Congress on Opportunities, Artifacts and Interpretation of Aberration-Corrected Electron Microscopy Data

2011 ◽  
Vol 17 (S1) ◽  
pp. 20-20
Author(s):  
Philip Batson ◽  
David Muller ◽  
Lawrence Allard ◽  
Paul Voyles ◽  
Miofang Chi ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Experimental Studies ◽  
Soft Materials ◽  
Subject Line ◽  
Practical Experiences ◽  
Microscopy Data ◽  
Poster Presentations ◽  
Image Collection ◽  
Difficult Situations ◽  
Aberration Corrected

This one-day pre-meeting congress, organized by the MSA Aberration-Corrected Electron Microscopy (ACEM) FIG, will be a forum for the discussion of the latest advances and solutions to problems associated with application of aberration correction technology. There will be platform presentations by both invited and contributed speakers, with poster presentations during a working lunch. Invited speakers will introduce innovations and issues, while contributors will highlight practical experiences and solutions to problems encountered during the application of ACEM to on-going experimental studies. This workshop includes: image collection/interpretation, new spectroscopies or other signals, artifacts and practical experiences in applications of ACEM to difficult situations such as hard/soft materials and in-situ experiments. All platform presentations will be intentionally kept short (∼15–20 minutes) to allow the maximum amount of interaction and information flow among attendees. Please send one page abstracts, including figures, to [email protected] with the subject line: M&M PMC Abstract.

The First Years of the Aberration-Corrected Electron Microscopy Century

2012 ◽  
Vol 18 (4) ◽  
pp. 652-655 ◽  
Author(s):  
Philip E. Batson
Keyword(s):  
Electron Microscopy ◽  
Incubation Period ◽  
21St Century ◽  
Aberration Correction ◽  
Enabling Technology ◽  
The Future ◽  
Aberration Corrected ◽  
The Way

AbstractAberration correction, after a 50 year incubation period of developing ideas and techniques while awaiting enabling technology, has transformed electron microscopy during the first dozen years of the 21st century. Some of the conditions that accompanied this transformation, the required complexity and its effect on the way microscopy is pursued, recent results that promise to change the field, and directions for the future are briefly described.

scholarly journals Introduction: Materials Research in an Aberration-Free Environment

2008 ◽  
Vol 14 (1) ◽  
pp. 1-1 ◽  
Author(s):  
David J. Smith
Keyword(s):  
Electron Microscopy ◽  
Spherical Aberration ◽  
Image Interpretation ◽  
Special Issue ◽  
Materials Research ◽  
Free Environment ◽  
Beam Currents ◽  
Novel Applications ◽  
Fixed Beam ◽  
Aberration Corrected

The last decade has witnessed a revolution in electron microscopy as online correction of spherical aberration has become a reality in both fixed-beam and scanning instruments. The combination of improved resolution and higher beam currents coupled with the prospect of simpler image interpretation has stimulated great interest and excitement across the entire field of microscopy. The Microscopy Society of America has an active Focused Interest Group on the topic of “Materials Research in an Aberration-Free Environment,” and its goal is to provide a forum for discussion and dissemination of the latest advances in instrumentation and novel applications of aberration-corrected electron microscopy. This special issue of Microscopy and Microanalysis contains contributions from the Pre-Meeting Congress on this topic held in Chicago, Illinois, in late July 2006, immediately preceding Microscopy & Microanalysis 2006.

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