Pre-Meeting Congress on Opportunities, Artifacts and Interpretation of Aberration-Corrected Electron Microscopy Data

2011 ◽  
Vol 17 (S1) ◽  
pp. 20-20
Author(s):  
Philip Batson ◽  
David Muller ◽  
Lawrence Allard ◽  
Paul Voyles ◽  
Miofang Chi ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Experimental Studies ◽  
Soft Materials ◽  
Subject Line ◽  
Practical Experiences ◽  
Microscopy Data ◽  
Poster Presentations ◽  
Image Collection ◽  
Difficult Situations ◽  
Aberration Corrected

This one-day pre-meeting congress, organized by the MSA Aberration-Corrected Electron Microscopy (ACEM) FIG, will be a forum for the discussion of the latest advances and solutions to problems associated with application of aberration correction technology. There will be platform presentations by both invited and contributed speakers, with poster presentations during a working lunch. Invited speakers will introduce innovations and issues, while contributors will highlight practical experiences and solutions to problems encountered during the application of ACEM to on-going experimental studies. This workshop includes: image collection/interpretation, new spectroscopies or other signals, artifacts and practical experiences in applications of ACEM to difficult situations such as hard/soft materials and in-situ experiments. All platform presentations will be intentionally kept short (∼15–20 minutes) to allow the maximum amount of interaction and information flow among attendees. Please send one page abstracts, including figures, to [email protected] with the subject line: M&M PMC Abstract.

scholarly journals Introduction: The Otto Scherzer Special Issue on Aberration-Corrected Electron Microscopy

2010 ◽  
Vol 16 (4) ◽  
pp. 365-365 ◽  
Author(s):  
David J. Smith ◽  
Uli Dahmen
Keyword(s):  
Electron Microscopy ◽  
Historical Context ◽  
Aberration Correction ◽  
Special Issue ◽  
Memorial Symposium ◽  
Recent Emergence ◽  
Rotationally Symmetric ◽  
Chromatic Aberrations ◽  
Poster Presentations ◽  
Aberration Corrected

The year 2009 marked the centenary of the birth of Otto Scherzer, one of the early pioneers of electron microscopy. Scherzer was the originator of the famous microscopy theorem that the spherical and chromatic aberrations of rotationally symmetric electron lenses were unavoidable. In honor of this centennial occasion, we organized a special memorial symposium during Microscopy & Microanalysis 2009, which was held in Richmond, Virginia, in late July. The introductory talks of the symposium presented a fascinating mix of first-hand accounts about working with Scherzer in Darmstadt and descriptions of the correction concepts and the early corrector prototypes that emerged from his group. Placed in this historical context, the latest advances in aberration correction for scanning and fixed-beam instruments that were presented in this symposium were all the more impressive and conveyed a vivid sense of history in the making. Applications of aberration correction to a broad range of materials were also highlighted in platform and poster presentations. This special issue of Microscopy and Microanalysis contains refereed contributions from the work presented at the symposium and thus provides a representative overview of the recent emergence of aberration-corrected electron microscopy (ACEM) and some of the prospects and challenges for this burgeoning field.

scholarly journals Introduction: Opportunities, Artifacts, and Interpretation of Aberration-Corrected Electron Microscopy Data

2012 ◽  
Vol 18 (4) ◽  
pp. 651-651
Author(s):  
Phil Batson ◽  
Dave Smith
Keyword(s):  
Electron Microscopy ◽  
Interest Group ◽  
Electron Microscopy Data ◽  
Microscopy Data ◽  
Aberration Corrected

A one-day pre-meeting workshop was held on August 7, 2011, immediately preceding the annual Microscopy and Microanalysis (M&M) 2011 meeting in Nashville, Tennessee. The workshop was organized by the Aberration-Corrected Electron Microscopy (ACEM) Focused Interest Group, with an Organizing Committee consisting of Phil Batson, Dave Muller, Larry Allard, Paul Voyles, Miofang Chi, and Mike O'Keefe.

The Otto Scherzer Memorial Symposium on Aberration-Corrected Electron Microscopy

2009 ◽  
Vol 17 (5) ◽  
pp. 10-13
Author(s):  
David J. Smith ◽  
Uli Dahmen
Keyword(s):  
Electron Microscopy ◽  
Historical Context ◽  
Aberration Correction ◽  
Short Account ◽  
Memorial Symposium ◽  
Rotationally Symmetric ◽  
Chromatic Aberrations ◽  
Poster Presentations ◽  
Fixed Beam ◽  
Aberration Corrected

The year 2009 marks the centenary of the birth of Otto Scherzer, one of the early pioneers of electron microscopy. Scherzer, shown in Figure 1, was the originator of the famous microscopy theorem that the spherical and chromatic aberrations of rotationally symmetric electron lenses were unavoidable [1]. In honor of this centennial occasion, we organized a special memorial symposium during the Microscopy & Microanalysis 2009 meeting, which was held in Richmond, Virginia, in late July. The introductory talks of the symposium presented a fascinating mix of firsthand accounts about working with Scherzer in Darmstadt and descriptions of the correction concepts and the early corrector prototypes that emerged from his group. Placed in this historical context, the latest advances in aberration correction for scanning and fixed-beam instruments that were presented in this symposium were all the more impressive and conveyed a vivid sense of history in the making. Representative applications of aberration correction to a broad range of materials were also highlighted in platform and poster presentations. Here we give a short account of the emergence of aberration-corrected electron microscopy (ACEM) and very briefly summarize some of the prospects and challenges for this burgeoning field. Further information about these developments, including details of applications, will be found in selected papers from the symposium, which will be published in a forthcoming issue of the journal Microscopy and Microanalysis due to appear in mid-2010.

scholarly journals Label-free fluorescence predictions from large-scale correlative light and electron microscopy data

2021 ◽  
Vol 27 (S1) ◽  
pp. 94-95
Author(s):  
Ryan Lane ◽  
Luuk Balkenende ◽  
Simon van Staalduine ◽  
Anouk Wolters ◽  
Ben Giepmans ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Large Scale ◽  
Light And Electron Microscopy ◽  
Label Free ◽  
Electron Microscopy Data ◽  
Microscopy Data

scholarly journals Aberration-corrected electron microscopy of MnAs and As nanocrystals and voids in annealed (Ga,Mn)As

2011 ◽  
Vol 326 ◽  
pp. 012018 ◽  
Author(s):  
A Kovács ◽  
T Kasama ◽  
J Sadowski ◽  
T Dietl ◽  
R E Dunin-Borkowski
Keyword(s):  
Electron Microscopy ◽  
Aberration Corrected

scholarly journals Adhesion of Soft Materials to Rough Surfaces: Experimental Studies, Statistical Analysis and Modelling

Coatings ◽  
2018 ◽  
Vol 8 (10) ◽  
pp. 350 ◽  
Author(s):  
Andrey Pepelyshev ◽  
Feodor Borodich ◽  
Boris Galanov ◽  
Elena Gorb ◽  
Stanislav Gorb
Keyword(s):  
Statistical Analysis ◽  
Smooth Surface ◽  
Rough Surfaces ◽  
Experimental Studies ◽  
Soft Materials ◽  
Adhesive Contact ◽  
Theoretical Modelling ◽  
Height Distribution ◽  
Depth Sensing ◽  
Adhesive Properties

Adhesion between rough surfaces is an active field of research where both experimental studies and theoretical modelling are used. However, it is rather difficult to conduct precise experimental evaluations of adhesive properties of the so-called anti-adhesive materials. Hence, it was suggested earlier by Purtov et al. (2013) to prepare epoxy resin replicas of surfaces having different topography and conduct depth-sensing indentation of the samples using a micro-force tester with a spherical smooth probe made of the compliant polydimethylsiloxane polymer in order to compare values of the force of adhesion to the surfaces. Surprising experimental observations were obtained in which a surface having very small roughness showed the greater value of the force of adhesion than the value for a replica of smooth surface. A plausible explanation of the data was given suggesting that these rough surfaces had full adhesive contact and their true contact area is greater than the area for a smooth surface, while the surfaces with higher values of roughness do not have full contact. Here, the experimental results of surface topography measurements and the statistical analysis of the data are presented. Several modern tests of normality used showed that the height distribution of the surfaces under investigation is normal (Gaussian) and hence the classic statistical models of adhesive contact between rough surfaces may formally be used. Employing one of the Galanov (2011) models of adhesive contact between rough surfaces, the plausible explanation of the experimental observations has been confirmed and theoretically justified.

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