scholarly journals Ultra-High Resolution Electron Tomography for Materials Science: a Roadmap

2011 ◽  
Vol 17 (S2) ◽  
pp. 934-935 ◽  
Author(s):  
K Batenburg ◽  
S Bals ◽  
S Van Aert ◽  
T Roelandts ◽  
J Sijbers

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Author(s):  
John L. Hutchison

Over the past five years or so the development of a new generation of high resolution electron microscopes operating routinely in the 300-400 kilovolt range has produced a dramatic increase in resolution, to around 1.6 Å for “structure resolution” and approaching 1.2 Å for information limits. With a large number of such instruments now in operation it is timely to assess their impact in the various areas of materials science where they are now being used. Are they falling short of the early expectations? Generally, the manufacturers’ claims regarding resolution are being met, but one unexpected factor which has emerged is the extreme sensitivity of these instruments to both floor-borne and acoustic vibrations. Successful measures to counteract these disturbances may require the use of special anti-vibration blocks, or even simple oil-filled dampers together with springs, with heavy curtaining around the microscope room to reduce noise levels. In assessing performance levels, optical diffraction analysis is becoming the accepted method, with rotational averaging useful for obtaining a good measure of information limits. It is worth noting here that microscope alignment becomes very critical for the highest resolution.In attempting an appraisal of the contributions of intermediate voltage HREMs to materials science we will outline a few of the areas where they are most widely used. These include semiconductors, oxides, and small metal particles, in addition to metals and minerals.


2004 ◽  
Vol 43 (48) ◽  
pp. 6745-6747 ◽  
Author(s):  
John Meurig Thomas ◽  
Paul A. Midgley ◽  
Timothy J. V. Yates ◽  
Jonathan S. Barnard ◽  
Robert Raja ◽  
...  

Author(s):  
S.Y. Zhang ◽  
J.M. Cowley

The combination of high resolution electron microscopy (HREM) and nanodiffraction techniques provided a powerful means for characterizing many of the interface structures which are of fundamental importance in materials science. In this work the interface structure between magnesium oxide and aluminum has been examined by HREM (with JEM-200CX) and nanodiffraction (with HB-5). The interfaces were formed by evaporating Al on freshly prepared cubic MgO smoke crystals under various vacuum conditions, at 10 -4, 10-5 10-6 and 10-7 torr. The Al layers on the MgO (001) surface are about 100Å thick. TEM observations were performed with the incident beam along the MgO [100] direction so that the interface could be revealed clearly. The nanodiffraction patterns were obtained with the electron beam of 15Å diameter parallel to the interface.


2013 ◽  
Vol 19 (S2) ◽  
pp. 540-541 ◽  
Author(s):  
D. Van Dyck ◽  
I.P. Lobato Hoyos ◽  
U. Luecken ◽  
H. Stark

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.


2001 ◽  
Vol 13 (9) ◽  
pp. 2033-2051 ◽  
Author(s):  
Marisa S. Otegui ◽  
David N. Mastronarde ◽  
Byung-Ho Kang ◽  
Sebastian Y. Bednarek ◽  
L. Andrew Staehelin

2004 ◽  
Vol 116 (48) ◽  
pp. 6913-6915 ◽  
Author(s):  
John Meurig Thomas ◽  
Paul A. Midgley ◽  
Timothy J. V. Yates ◽  
Jonathan S. Barnard ◽  
Robert Raja ◽  
...  

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