Origins of Fermi-Level Pinning between Molybdenum Dichalcogenides (MoSe2, MoTe2) and Bulk Metal Contacts: Interface Chemistry and Band Alignment

2019 ◽  
Vol 123 (39) ◽  
pp. 23919-23930 ◽  
Author(s):  
Christopher M. Smyth ◽  
Rafik Addou ◽  
Christopher L. Hinkle ◽  
Robert M. Wallace
2017 ◽  
Vol 9 (22) ◽  
pp. 19278-19286 ◽  
Author(s):  
Pantelis Bampoulis ◽  
Rik van Bremen ◽  
Qirong Yao ◽  
Bene Poelsema ◽  
Harold J. W. Zandvliet ◽  
...  

ACS Nano ◽  
2017 ◽  
Vol 11 (2) ◽  
pp. 1588-1596 ◽  
Author(s):  
Changsik Kim ◽  
Inyong Moon ◽  
Daeyeong Lee ◽  
Min Sup Choi ◽  
Faisal Ahmed ◽  
...  

2021 ◽  
Author(s):  
Jisu Jang ◽  
Hyun-Soo Ra ◽  
Jongtae Ahn ◽  
Tae Wook Kim ◽  
Seung Ho Song ◽  
...  

Abstract Precise control over the polarity of transistors is a key necessity for the construction of complementary metal–oxide–semiconductor circuits. However, the polarity control of two-dimensional (2D) transistors remains a challenge because of Fermi-level pinning resulting from disorders at metal–semiconductor interfaces. Here, we propose a strategy for clean van der Waals contacts, wherein a metallic 2D material, chlorine-doped SnSe2 (Cl–SnSe2), is used as the contact to provide an interface that is free of defects and Fermi-level pinning. Such clean contacts created via van der Waals integration of a 2D metal possess nearly ideal Schottky barrier heights, thus permitting polarity-controllable transistors. With the integration of 2D metallic Cl–SnSe2 as contacts, WSe2 transistors exhibit pronounced p-type characteristics, which are distinctly different from those of the devices with evaporated metal contacts, where n-type transport is observed. Finally, this ability to control the polarity enables the fabrication of functional logic gates and circuits, including inverter, NAND, and NOR.


2020 ◽  
Vol 116 (21) ◽  
pp. 213506 ◽  
Author(s):  
Sumaiya Wahid ◽  
Nadim Chowdhury ◽  
Md Kawsar Alam ◽  
Tomás Palacios

2012 ◽  
Vol 45 (3) ◽  
pp. 119-135
Author(s):  
X. L. Wang ◽  
W. Wang ◽  
K. Han ◽  
J. Zhang ◽  
J. Xiang ◽  
...  

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