Atomic Layer Deposition of Al2O3 Using Trimethylaluminum and H2O: The Kinetics of the H2O Half-Cycle

Surface reaction kinetics of room temperature atomic layer deposition of ZnO observed by in situ IR absorption spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5079465 ◽

2019 ◽

Vol 37 (2) ◽

pp. 020922

Author(s):

Kazuki Yoshida ◽

Kentaro Saito ◽

Masanori Miura ◽

Kensaku Kanomata ◽

Fumihiko Hirose

Keyword(s):

Atomic Layer Deposition ◽

Room Temperature ◽

Surface Reaction ◽

Atomic Layer ◽

Ir Absorption ◽

Layer Deposition ◽

In Situ Ir ◽

Surface Reaction Kinetics ◽

Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride

RSC Advances ◽

10.1039/c6ra10909h ◽

2016 ◽

Vol 6 (72) ◽

pp. 68515-68524 ◽

Cited By ~ 15

Author(s):

Luchana L. Yusup ◽

Jae-Min Park ◽

Yong-Ho Noh ◽

Sun-Jae Kim ◽

Won-Jun Lee ◽

...

Keyword(s):

Silicon Nitride ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Surface Sites ◽

Thermodynamics And Kinetics ◽

Layer Deposition ◽

The reactivity of surface sites plays a very important role to determine the thermodynamics and kinetics of ALD processes.

Kinetics of the WF6 and Si2H6 surface reactions during tungsten atomic layer deposition

Surface Science ◽

10.1016/s0039-6028(01)00969-4 ◽

2001 ◽

Vol 479 (1-3) ◽

pp. 121-135 ◽

Cited By ~ 47

Author(s):

J.W Elam ◽

C.E Nelson ◽

R.K Grubbs ◽

S.M George

Keyword(s):

Atomic Layer Deposition ◽

Surface Reactions ◽

Atomic Layer ◽

Layer Deposition ◽

Kinetics of Adsorption of Methylcyclopentadienyl Manganese Tricarbonyl on Copper Surfaces and Implications for the Atomic Layer Deposition of Thin Solid Films

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.6b02197 ◽

2016 ◽

Vol 120 (15) ◽

pp. 8232-8239 ◽

Cited By ~ 7

Author(s):

Menno Bouman ◽

Francisco Zaera

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Thin Solid Films ◽

Kinetics Of Adsorption ◽

Copper Surfaces ◽

Solid Films ◽

Layer Deposition ◽

Methylcyclopentadienyl Manganese Tricarbonyl ◽

Manganese Tricarbonyl ◽

Surface reactions of TiCl4 and Al(CH3)3 on GaAs(100) during the first half-cycle of atomic layer deposition

Surface Science ◽

10.1016/j.susc.2011.04.009 ◽

2011 ◽

Vol 605 (13-14) ◽

pp. 1243-1248 ◽

Cited By ~ 14

Author(s):

Bernal Granados-Alpizar ◽

Anthony J. Muscat

Keyword(s):

Atomic Layer Deposition ◽

Surface Reactions ◽

Atomic Layer ◽

Half Cycle ◽

In situ atomic layer deposition half cycle study of Al2O3 growth on AlGaN

Applied Physics Letters ◽

10.1063/1.4767520 ◽

2012 ◽

Vol 101 (21) ◽

pp. 211604 ◽

Cited By ~ 33

Author(s):

Barry Brennan ◽

Xiaoye Qin ◽

Hong Dong ◽

Jiyoung Kim ◽

Robert M. Wallace

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Half Cycle ◽

The kinetics of low-temperature spatial atomic layer deposition of aluminum oxide

Thin Solid Films ◽

10.1016/j.tsf.2012.10.109 ◽

2013 ◽

Vol 532 ◽

pp. 22-25 ◽

Cited By ~ 12

Author(s):

P. Poodt ◽

A. Illiberi ◽

F. Roozeboom

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Aluminum Oxide ◽

Atomic Layer ◽

Layer Deposition ◽

Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.5b10529 ◽

2016 ◽

Vol 120 (8) ◽

pp. 4337-4344 ◽

Cited By ~ 10

Author(s):

Michael Reinke ◽

Yury Kuzminykh ◽

Patrik Hoffmann

Keyword(s):

Atomic Layer Deposition ◽

Reaction Kinetics ◽

Surface Reaction ◽

Atomic Layer ◽

Titanium Isopropoxide ◽

Layer Deposition ◽

Surface Reaction Kinetics ◽

Arsenic decapping and half cycle reactions during atomic layer deposition of Al2O3 on In0.53Ga0.47As(001)

Applied Physics Letters ◽

10.1063/1.3452336 ◽

2010 ◽

Vol 96 (25) ◽

pp. 252907 ◽

Cited By ~ 33

Author(s):

Byungha Shin ◽

Jonathon B. Clemens ◽

Michael A. Kelly ◽

Andrew C. Kummel ◽

Paul C. McIntyre

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Half Cycle ◽

Half-cycle atomic layer deposition reaction studies of Al2O3 on In0.2Ga0.8As (100) surfaces

Applied Physics Letters ◽

10.1063/1.3033404 ◽

2008 ◽

Vol 93 (20) ◽

pp. 202902 ◽

Cited By ~ 128

Author(s):

M. Milojevic ◽

F. S. Aguirre-Tostado ◽

C. L. Hinkle ◽

H. C. Kim ◽

E. M. Vogel ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Half Cycle ◽