Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications

2021 ◽  
Vol 3 (2) ◽  
pp. 999-1005
Author(s):  
Hyeok Jae Lee ◽  
Jin Ha Hwang ◽  
Ji-Yong Park ◽  
Sang Woon Lee
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Surface Reaction ◽  
Atomic Layer ◽  
Reaction Route ◽  
Layer Deposition

Atomic Layer Deposition of Titanium Nitride Thin Films Using tert-Butylamine and Allylamine as Reductive Nitrogen Sources

2002 ◽  
Vol 5 (1) ◽  
pp. C4 ◽  
Author(s):  
Marika Juppo ◽  
Petra Alén ◽  
Mikko Ritala ◽  
Timo Sajavaara ◽  
Juhani Keinonen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Nitrogen Sources ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Tert Butylamine

Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition

2017 ◽  
Vol 30 (9) ◽  
pp. 095010 ◽  
Author(s):  
Y T Yemane ◽  
M J Sowa ◽  
J Zhang ◽  
L Ju ◽  
E W Deguns ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Niobium Titanium

scholarly journals Atomic layer deposition of transparent semiconducting oxide CuCrO2 thin films

2015 ◽  
Vol 3 (32) ◽  
pp. 8364-8371 ◽  
Author(s):  
T. S. Tripathi ◽  
Janne-Petteri Niemelä ◽  
Maarit Karppinen
Keyword(s):  
Thin Films ◽  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Gas Phase ◽  
Surface Reaction ◽  
Atomic Layer ◽  
Atomic Level ◽  
High Quality ◽  
Layer Deposition ◽  
Controlled Deposition

Atomic layer deposition (ALD) is a vital gas-phase technique for atomic-level thickness-controlled deposition of high-quality thin films of CuCrO2 on various substrate morphologies owing to its self-limiting gas-surface reaction mechanism.

Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc

2009 ◽  
Vol 121 (25) ◽  
pp. 4606-4609 ◽  
Author(s):  
Byoung H. Lee ◽  
Jae K. Hwang ◽  
Jae W. Nam ◽  
Song U. Lee ◽  
Jun T. Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Surface Reaction ◽  
Atomic Layer ◽  
Copper Metal ◽  
Metal Thin Films ◽  
Layer Deposition ◽  
Limiting Surface

scholarly journals Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride

2019 ◽  
Vol 9 (12) ◽  
pp. 4556
Author(s):  
Sasha Woodward-Gagné ◽  
Nicolas Desjardins-Lecavalier ◽  
Bill Baloukas ◽  
Oleg Zabeida ◽  
Ludvik Martinu
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Angular Selectivity

Stress modulation of titanium nitride thin films deposited using atomic layer deposition

2017 ◽  
Vol 35 (1) ◽  
pp. 01B144 ◽  
Author(s):  
Manuj Nahar ◽  
Noel Rocklein ◽  
Michael Andreas ◽  
Greg Funston ◽  
Duane Goodner
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Layer Deposition

Low-temperature (≤200 °C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

2013 ◽  
Vol 31 (1) ◽  
pp. 01A137 ◽  
Author(s):  
Nigamananda Samal ◽  
Hui Du ◽  
Russell Luberoff ◽  
Krishna Chetry ◽  
Randhir Bubber ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Dense Titanium

scholarly journals Tertiary alkyl halides as growth activator and inhibitor for novel atomic layer deposition of low resistive titanium nitride

AIP Advances ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 015218
Author(s):  
Changbong Yeon ◽  
Jaesun Jung ◽  
Hyeran Byun ◽  
Kok Chew Tan ◽  
Taeho Song ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Alkyl Halides ◽  
Layer Deposition ◽  
Tertiary Alkyl
Sign in / Sign up

Export Citation Format

Share Document