Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine
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2006 ◽
Vol 45
(8A)
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pp. 6342-6345
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2013 ◽
Vol 1
(39)
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pp. 6188
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Keyword(s):
Atmospheric Pressure Chemical Vapor Deposition of Copper Thin Films: I . Horizontal Hot Wall Reactor
1991 ◽
Vol 138
(11)
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pp. 3499-3504
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1988 ◽
Vol 17
(6)
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pp. 509-517
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