Dependence of Solar Cell Performance on Electronic Properties at Grain Boundaries in Polycrystalline Silicon Thin Films Deposited by Atmospheric Pressure Chemical Vapor Deposition

2006 ◽  
Vol 45 (8A) ◽  
pp. 6342-6345 ◽  
Author(s):  
Tsutomu Yamazaki ◽  
Yoshiaki Matsumura ◽  
Yukiharu Uraoka ◽  
Takashi Fuyuki
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Solar Cell Performance ◽  
Silicon Thin Films ◽  
Pressure Chemical

Atmospheric pressure chemical vapor deposition of silicon thin films using cyclohexasilane

2014 ◽  
Author(s):  
Srinivasan Guruvenket ◽  
Justin Hoey ◽  
Kenneth Anderson ◽  
Matt Frohlich ◽  
Gregory Strommen ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Silicon Thin Films ◽  
Pressure Chemical

scholarly journals Aerosol assisted atmospheric pressure chemical vapor deposition of silicon thin films using liquid cyclic hydrosilanes

2015 ◽  
Vol 589 ◽  
pp. 465-471 ◽  
Author(s):  
Srinivasan Guruvenket ◽  
Justin M. Hoey ◽  
Kenneth J. Anderson ◽  
Matthew T. Frohlich ◽  
Robert A. Sailer ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Silicon Thin Films ◽  
Pressure Chemical

Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine

2004 ◽  
Vol 16 (6) ◽  
pp. 1120-1125 ◽  
Author(s):  
Christopher S. Blackman ◽  
Claire J. Carmalt ◽  
Shane A. O'Neill ◽  
Ivan P. Parkin ◽  
Leonardo Apostolico ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Metal Phosphide ◽  
Pressure Chemical

Growth of “New Form” of Polycrystalline Silicon Thin Films Synthesized by Hot Wire Chemical Vapor Deposition

2005 ◽  
Vol 862 ◽  
Author(s):  
A. R. Middya ◽  
J-J. Liang ◽  
K. Ghosh
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Crystallographic Structure ◽  
Hot Wire ◽  
Silicon Thin Films ◽  
Vapor Deposition Technique ◽  
New Form

AbstractIn this work, we report on next-generation hot wire chemical vapor deposition technique, we call it ceramics hot-wire CVD. Using a new concept of rectangular ceramics filament holder and “confinement of thermal radiation from the filament”, a “new form” of polycrystalline silicon thin films has been developed at low temperature (˜ 250°C). The grains are found to be symmetrically distributed in array along the parallel lines, in (111) direction. On the surface of individual grains, “five-fold” and “six-fold” symmetries have been observed and we suspect that we developed “buckyball” type “giant silicon molecular solids” with different crystalline silicon lattice other than standard single-crystal silicon structure. We observed rarely found “icosaderal” symmetry in silicon thin films. This hypothesis has been supported by multiple Raman active transverse optical modes and the crystallographic structure analyzed by X-ray diffraction.

Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

2013 ◽  
Vol 1 (39) ◽  
pp. 6188 ◽  
Author(s):  
Erik R. Klobukowski ◽  
Wyatt E. Tenhaeff ◽  
James W. McCamy ◽  
Caroline S. Harris ◽  
Chaitanya K. Narula
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Solar Panels ◽  
Pressure Chemical ◽  
High Silica

Control of Orientation for Polycrystalline Silicon Thin Films Fabricated from Fluorinated Source Gas by Microwave Plasma Enhanced Chemical Vapor Deposition

1998 ◽  
Vol 37 (Part 2, No. 9A/B) ◽  
pp. L1026-L1029 ◽  
Author(s):  
Kouichi Nakahata ◽  
Atsushi Miida ◽  
Toshio Kamiya ◽  
Yoshiteru Maeda ◽  
Charles M. Fortmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Silicon Thin Films
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