Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Solar Panels ◽

Pressure Chemical ◽

High Silica

Dependence of Solar Cell Performance on Electronic Properties at Grain Boundaries in Polycrystalline Silicon Thin Films Deposited by Atmospheric Pressure Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.6342 ◽

2006 ◽

Vol 45 (8A) ◽

pp. 6342-6345 ◽

Cited By ~ 2

Author(s):

Tsutomu Yamazaki ◽

Yoshiaki Matsumura ◽

Yukiharu Uraoka ◽

Takashi Fuyuki

Keyword(s):

Thin Films ◽

Solar Cell ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Solar Cell Performance ◽

Silicon Thin Films ◽

Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine

Chemistry of Materials ◽

10.1021/cm031161f ◽

2004 ◽

Vol 16 (6) ◽

pp. 1120-1125 ◽

Cited By ~ 13

Author(s):

Christopher S. Blackman ◽

Claire J. Carmalt ◽

Shane A. O'Neill ◽

Ivan P. Parkin ◽

Leonardo Apostolico ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Metal Phosphide ◽

Atmospheric Pressure Chemical Vapor Deposition of Copper Thin Films: I . Horizontal Hot Wall Reactor

Journal of The Electrochemical Society ◽

10.1149/1.2085441 ◽

1991 ◽

Vol 138 (11) ◽

pp. 3499-3504 ◽

Cited By ~ 42

Author(s):

W. G. Lai ◽

Y. Xie ◽

G. L. Griffin

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Atmospheric pressure chemical vapor deposition of silicon thin films using cyclohexasilane

2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2014.6925583 ◽

2014 ◽

Author(s):

Srinivasan Guruvenket ◽

Justin Hoey ◽

Kenneth Anderson ◽

Matt Frohlich ◽

Gregory Strommen ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors

Chemistry of Materials ◽

10.1021/cm00009a010 ◽

1990 ◽

Vol 2 (3) ◽

pp. 235-241 ◽

Cited By ~ 156

Author(s):

Renaud M. Fix ◽

Roy G. Gordon ◽

David M. Hoffman

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Textured aluminum‐doped zinc oxide thin films from atmospheric pressure chemical‐vapor deposition

Journal of Applied Physics ◽

10.1063/1.351309 ◽

1992 ◽

Vol 71 (2) ◽

pp. 880-890 ◽

Cited By ~ 507

Author(s):

Jianhua Hu ◽

Roy G. Gordon

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical ◽

Aluminum Doped Zinc Oxide

Hybrid Aerosol Assisted Atmospheric Pressure Chemical Vapor Deposition: A Facile Route Toward Nanocomposite Thin Films?

ECS Meeting Abstracts ◽

10.1149/ma2009-02/34/2583 ◽

2009 ◽

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Nanocomposite Thin Films ◽

Pressure Chemical ◽

Facile Route

N Titania Thin Films, Prepared by Atmospheric Pressure Chemical Vapor Deposition: Enhanced Visible Light Photocatalytic Activity and Antimicrobial Effects

ECS Meeting Abstracts ◽

10.1149/ma2009-02/34/2472 ◽

2009 ◽

Keyword(s):

Thin Films ◽

Photocatalytic Activity ◽

Visible Light ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Visible Light Photocatalytic Activity ◽

Pressure Chemical ◽

Visible Light Photocatalytic

A study of aluminum oxide thin films prepared by atmospheric-pressure chemical vapor deposition from trimethylaluminum + oxygen and/or nitrous oxide

Journal of Electronic Materials ◽

10.1007/bf02652101 ◽

1988 ◽

Vol 17 (6) ◽

pp. 509-517 ◽

Cited By ~ 17

Author(s):

Kenneth Michael Gustin ◽

Roy Gerald Gordon

Keyword(s):

Thin Films ◽

Nitrous Oxide ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Low-temperature atmospheric-pressure chemical vapor deposition of tungsten oxide thin films

Thin Solid Films ◽

10.1016/0040-6090(93)90233-f ◽

1993 ◽

Vol 235 (1-2) ◽

pp. 15-16 ◽

Cited By ~ 20

Author(s):

Umar Riaz

Keyword(s):

Thin Films ◽

Low Temperature ◽

Tungsten Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical ◽

Tungsten Oxide Thin Films