Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from W2(NMe2)6and Water: Precursor-Based Control of Oxidation State in the Thin Film Material
2006 ◽
Vol 128
(30)
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pp. 9638-9639
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2004 ◽
Vol 374
(1-2)
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pp. 124-128
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2014 ◽
Vol 20
(7-8-9)
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pp. 217-223
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2016 ◽
Vol 32
(1)
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pp. 37-44
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2018 ◽
Vol 36
(6)
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pp. 06A104
2010 ◽
Vol 157
(10)
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pp. G193
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