Formation, Characterization, and Sub-50-nm Patterning of Organosilane Monolayers with Embedded Disulfide Bonds: An Engineered Self-Assembled Monolayer Resist for Electron-Beam Lithography
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2007 ◽
Vol 7
(2)
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pp. 410-417
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2004 ◽
Vol 234
(1-4)
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pp. 102-106
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2004 ◽
Vol 43
(7A)
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pp. 4396-4397
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2008 ◽
Vol 26
(6)
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pp. 2351-2355
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