TiO2–graphene hybrid nanostructures by atomic layer deposition with enhanced electrochemical performance for Pb(ii) and Cd(ii) detection

RSC Advances ◽  
2015 ◽  
Vol 5 (6) ◽  
pp. 4343-4349 ◽  
Author(s):  
Hongfen Zhang ◽  
Shaomin Shuang ◽  
Guizhen Wang ◽  
Yujing Guo ◽  
Xili Tong ◽  
...  
Keyword(s):  
Heavy Metal ◽  
Atomic Layer Deposition ◽  
Electrochemical Performance ◽  
Metal Ions ◽  
Heavy Metal Ions ◽  
Atomic Layer ◽  
Hybrid Nanostructures ◽  
Enhanced Sensitivity ◽  
Layer Deposition ◽  
Enhanced Electrochemical Performance

Graphene coated with TiO2 by atomic layer deposition exhibits markedly enhanced sensitivity for detection of heavy metal ions.

Atomic layer deposition of Al2O3 on LiNi0.68Co0.10Mn0.22O2 for enhanced electrochemical performance

2020 ◽  
Vol 271 ◽  
pp. 127771
Author(s):  
Yangyang Chen ◽  
Mingshan Wang ◽  
Junchen Chen ◽  
Jun Yang ◽  
Zhuangzhi Li ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electrochemical Performance ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Enhanced Electrochemical Performance

Controllable n-Fe2O3@graphene nanomaterials by ALD applied in an aptasensor with enhanced electrochemical performance for thrombin detection

2017 ◽  
Vol 46 (23) ◽  
pp. 7434-7440 ◽  
Author(s):  
Hongfen Zhang ◽  
Baiyan Zhang ◽  
Anjia Chen ◽  
Yong Qin
Keyword(s):  
Atomic Layer Deposition ◽  
Electrochemical Performance ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Enhanced Electrochemical Performance ◽  
Controllable Preparation ◽  
Graphene Nanostructure

An elegant atomic layer deposition (ALD) method has been employed for the controllable preparation of a uniform Fe2O3-coated graphene nanostructure (Fe2O3@graphene).

Characterization and Electrochemical Performance at High Discharge Rates of Tin Dioxide Thin Films Synthesized by Atomic Layer Deposition

2017 ◽  
Vol 46 (11) ◽  
pp. 6571-6577 ◽  
Author(s):  
M. Yu. Maximov ◽  
P. A. Novikov ◽  
D. V. Nazarov ◽  
A. M. Rymyantsev ◽  
A. O. Silin ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Electrochemical Performance ◽  
Tin Dioxide ◽  
Atomic Layer ◽  
High Discharge ◽  
Discharge Rates ◽  
Layer Deposition

Improved electrochemical performance of LiNi0.8Co0.15Al0.05O2 with ultrathin and thickness-controlled TiO2 shell via atomic layer deposition technology

RSC Advances ◽  
2016 ◽  
Vol 6 (103) ◽  
pp. 100841-100848 ◽  
Author(s):  
Gaole Dai ◽  
Hongjuan Du ◽  
ShanShan Wang ◽  
Jiali Cao ◽  
Min Yu ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electrochemical Performance ◽  
Atomic Layer ◽  
Cycling Performance ◽  
Layer Deposition ◽  
Tio2 Shell ◽  
Deposition Technology

Thickness-controlled TiO2 shell and enhanced cycling performance.

Atomic layer deposition ZnO film as seed layer for hydrothermal growth of ZnO nanorods

2010 ◽  
Vol 1258 ◽  
Author(s):  
Xianglin Li ◽  
Chuanwei Cheng ◽  
Hongjin Fan
Keyword(s):  
Atomic Layer Deposition ◽  
Seed Layer ◽  
Zno Nanorods ◽  
Three Dimensional ◽  
Atomic Layer ◽  
Dip Coating ◽  
Hybrid Nanostructures ◽  
Zno Film ◽  
Layer Deposition ◽  
Coating Method

AbstractAtomic layer deposition (ALD) ZnO film as seed layer for growing aligned ZnO nanorods arrays is demonstrated. The effects of the deposition temperature and film thickness to the morphology of the ZnO nanorods are studied. The ALD is found to have its advantage over the conventional dip-coating method when being applied to three-dimensional (3D) substrates, as exemplified by the macroporous Si adn CNT arrays. As one example, the CNT-ZnO 3D hybrid nanostructures are obtained which might be useful for energy-related applications.

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