Metal-catalyst-free growth of graphene on insulating substrates by ammonia-assisted microwave plasma-enhanced chemical vapor deposition
Keyword(s):
We study the metal-catalyst-free growth of uniform and continuous graphene on different insulating substrates by microwave plasma-enhanced chemical vapor deposition (PECVD) with a gas mixture of C2H2, NH3, and H2 at a temperature of 700–750 °C.
Keyword(s):
2000 ◽
Vol 132
(1)
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pp. 6-10
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