Impact of the Ga flux incidence angle on the growth kinetics of self-assisted GaAs nanowires on Si(111)
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In this work we show that the incidence angle of group-III element fluxes plays a significant role in the diffusion-controlled growth of self-assisted III–V nanowires by molecular beam epitaxy.
2020 ◽
Vol 32
(47)
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pp. 475002
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2005 ◽
Vol 23
(4)
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pp. 1706
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2010 ◽
Vol 312
(2)
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pp. 209-212
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1999 ◽
Vol 201-202
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pp. 461-464
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1996 ◽
Vol 14
(3)
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pp. 2346
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