scholarly journals AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing

RSC Advances ◽  
2019 ◽  
Vol 9 (22) ◽  
pp. 12226-12231 ◽  
Author(s):  
Wei-Chung Kao ◽  
Wei-Hao Lee ◽  
Sheng-Han Yi ◽  
Tsung-Han Shen ◽  
Hsin-Chih Lin ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Atomic Layer ◽  
Layer By Layer ◽  
Schematic Diagram ◽  
Layer Deposition ◽  
Processing Cycle

The schematic diagram of the processing cycle including the atomic layer annealing (ALA) to achieve low-temperature epitaxial growth of AlN on SiC.

scholarly journals Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation

2020 ◽  
Vol 53 (34) ◽  
pp. 345105
Author(s):  
A V Uvarov ◽  
A S Gudovskikh ◽  
V N Nevedomskiy ◽  
A I Baranov ◽  
D A Kudryashov ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Atomic Layer ◽  
Plasma Activation ◽  
Layer Deposition

In Situ Spectroscopic Approach to Atomic Layer Deposition

2002 ◽  
Vol 745 ◽  
Author(s):  
Martin M. Frank ◽  
Yves J. Chabal ◽  
Glen D. Wilk
Keyword(s):  
Infrared Spectroscopy ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Gate Oxide ◽  
Silicon Surfaces ◽  
Oxide Growth ◽  
Layer By Layer ◽  
Layer Deposition

ABSTRACTThere is great need for a mechanistic understanding of growth chemistry during atomic layer deposition (ALD) of films for electronic applications. Since commercial ALD reactors are presently not equipped for in situ spectroscopy, we have constructed a model reactor that enables single-pass transmission infrared spectroscopy to be performed in situ on a layer-by-layer basis. We demonstrate the viability of this approach for the study of aluminum oxide growth on silicon surfaces, motivated by alternative gate oxide applications. Thanks to submonolayer dielectric and adsorbate sensitivity, we can quantify oxide thicknesses and hydroxyl areal densities on thermal and chemical SiO2/Si(100) substrates. Methyl formation and hydroxyl consumption upon initial trimethylaluminum (TMA) reaction can also be followed. We verify that in situ grown Al2O3 films are compatible in structure to films grown in a commercial ALD reactor.

scholarly journals Layer-by-layer photonic crystal fabricated by low-temperature atomic layer deposition

2007 ◽  
Vol 90 (15) ◽  
pp. 151101 ◽  
Author(s):  
Jae-Hwang Lee ◽  
Wai Leung ◽  
Jinho Ahn ◽  
Taeho Lee ◽  
In-Sung Park ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer By Layer ◽  
Layer Deposition

In situ XPS study of low temperature atomic layer deposition of B2O3 films on Si using BCl3 and H2O precursors

2018 ◽  
Vol 36 (6) ◽  
pp. 061503 ◽  
Author(s):  
Aparna Pilli ◽  
Jessica Jones ◽  
Veronica Lee ◽  
Natasha Chugh ◽  
Jeffry Kelber ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Xps ◽  
Layer Deposition ◽  
Xps Study

Local Epitaxial Growth of Ru Thin Films by Atomic Layer Deposition at Low Temperature

2011 ◽  
Vol 158 (8) ◽  
pp. D477 ◽  
Author(s):  
Seong Keun Kim ◽  
Sora Han ◽  
Gun Hwan Kim ◽  
Jae Hyuck Jang ◽  
Jeong Hwan Han ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition

2020 ◽  
Vol 32 (11) ◽  
pp. 4481-4489 ◽  
Author(s):  
Nathan J. O’Brien ◽  
Polla Rouf ◽  
Rouzbeh Samii ◽  
Karl Rönnby ◽  
Sydney C. Buttera ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Indium Nitride ◽  
Atomic Layer ◽  
Layer Deposition ◽  
In Situ Activation

Low temperature formation of higher-k cubic phase HfO2 by atomic layer deposition on GeOx/Ge structures fabricated by in-situ thermal oxidation

2016 ◽  
Vol 108 (5) ◽  
pp. 052903 ◽  
Author(s):  
R. Zhang ◽  
P.-C. Huang ◽  
N. Taoka ◽  
M. Yokoyama ◽  
M. Takenaka ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thermal Oxidation ◽  
Atomic Layer ◽  
Cubic Phase ◽  
Layer Deposition
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