Charateristics of Low Temperature High Quality Silicon Oxide by Plasma
Enhanced Atomic Layer Deposition with In Situ Plasma Densification
Process
Keyword(s):
Keyword(s):
2010 ◽
Vol 31
(8)
◽
pp. 857-859
◽
Keyword(s):
2010 ◽
Vol 132
(1)
◽
pp. 36-37
◽
Keyword(s):
2019 ◽
Vol 19
(5)
◽
pp. 2882-2887
Keyword(s):
2010 ◽
Vol 49
(4)
◽
pp. 04DB11
◽
Keyword(s):
2014 ◽
Vol 32
(1)
◽
pp. 01A108
◽
Keyword(s):