A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur
Keyword(s):
Crystalline MoS2 thin films are deposited via MOCVD using a new molybdenum precursor, 1,4-di-tert-butyl-1,4-diazabutadienyl-bis(tert-butylimido)molybdenum(vi) [Mo(NtBu)2(tBu2DAD)], and elemental sulfur.
2000 ◽
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pp. L726-L729
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1996 ◽
Vol 167
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pp. 8-16
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2006 ◽
Vol 41
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pp. 3189-3191
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2006 ◽
Vol 137
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pp. 196-198
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2005 ◽
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pp. 959-964
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2010 ◽
Vol 21
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pp. 136-140
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