scholarly journals High performance and gate-controlled GeSe/HfS2 negative differential resistance device

RSC Advances ◽  
2022 ◽  
Vol 12 (3) ◽  
pp. 1278-1286
Author(s):  
Amir Muhammad Afzal ◽  
Muhammad Zahir Iqbal ◽  
Muhammad Waqas Iqbal ◽  
Thamer Alomayri ◽  
Ghulam Dastgeer ◽  
...  

A novel and astonishing p-GeSe/n-HfS2 NDR device shows a high value for the peak-to-valley current ratio in the range of 5.8.

1996 ◽  
Vol 448 ◽  
Author(s):  
Akira Izumi ◽  
Noriyuki Matsubara ◽  
Yusuke Kushida ◽  
Kazuo Tsutsui ◽  
Nikolai S. Sokolov

AbstractWe proposed use of a new CdF2/CaF2 heterointerface for the formation of large conduction band discontinuities to apply quantum effect devices fabricated on Si substrates. Resonant tunneling diodes using this heterointerface on Si were fabricated and negative differential resistance whose P/V current ratio of 24 at highest was observed at room temperature.


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