Low threshold current density operation of GaInNAs quantum well lasers grown by metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:20001268 ◽

2000 ◽

Vol 36 (21) ◽

pp. 1776 ◽

Author(s):

M. Kawaguchi ◽

E. Gouardes ◽

D. Schlenker ◽

T. Kondo ◽

T. Miyamoto ◽

...

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Current Density ◽

Vapour Deposition ◽

Chemical Vapour ◽

Threshold Current ◽

Threshold Current Density ◽

Low Threshold ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Low threshold current density GaAsSb quantum well (QW) lasers grown by metal organic chemical vapour deposition on GaAs substrates

Electronics Letters ◽

10.1049/el:20000853 ◽

2000 ◽

Vol 36 (16) ◽

pp. 1387 ◽

Author(s):

Sang-Wan Ryu ◽

P.D. Dapkus

Keyword(s):

Quantum Well ◽

Current Density ◽

Vapour Deposition ◽

Chemical Vapour ◽

Threshold Current ◽

Threshold Current Density ◽

Organic Chemical ◽

Gaas Substrates ◽

Metal Organic ◽

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Effect of Al Doping in the InGaN/GaN Multiple Quantum Well Light Emitting Diodes Grown by Metalorganic Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/23/1/074 ◽

2006 ◽

Vol 23 (1) ◽

pp. 256-258 ◽

Author(s):

Lu Yu ◽

Yang Zhi-Jian ◽

Pan Yao-Bo ◽

Xu Ke ◽

Hu Xiao-Dong ◽

...

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Multiple Quantum Well ◽

Chemical Vapour ◽

Multiple Quantum ◽

Al Doping ◽

Light Emitting ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Long wavelength room temperature laser operation of a strained InGaAs/GaAs quantum well structure monolithically grown by metalorganic chemical vapour deposition on a low energy-plasma enhanced chemical vapour deposition graded misoriented Ge/Si virtual substrate

Optical Materials ◽

10.1016/j.optmat.2004.08.022 ◽

2005 ◽

Vol 27 (5) ◽

pp. 846-850 ◽

Author(s):

Y. Chriqui ◽

G. Saint-Girons ◽

G. Isella ◽

H. von Kaenel ◽

S. Bouchoule ◽

...

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Laser Operation ◽

Long Wavelength ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Diffraction-coupled, phase-locked arrays of antiguided, quantum-well lasers grown by metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19880652 ◽

1988 ◽

Vol 24 (15) ◽

pp. 958 ◽

Author(s):

L.J. Mawst ◽

D. Botez ◽

T.J. Roth ◽

G. Peterson ◽

J.J. Yang

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Quantum Well Lasers ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Comparison of chemical beam epitaxy and metalorganic chemical vapour deposition for highly strained multiple quantum well InGaAsP/InP 1.5 μm lasers

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90383-2 ◽

1994 ◽

Vol 136 (1-4) ◽

pp. 56-63 ◽

Author(s):

D.C. Houghton ◽

M. Davies ◽

T. Sudersena Rao ◽

M. Dion

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Multiple Quantum Well ◽

Chemical Vapour ◽

Multiple Quantum ◽

Chemical Beam Epitaxy ◽

Metalorganic Chemical Vapour Deposition ◽

Highly Strained ◽

Metalorganic Chemical

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CW room-temperature visible single quantum well Ga0.73Al0.27As diode lasers grown by metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19820345 ◽

1982 ◽

Vol 18 (12) ◽

pp. 507 ◽

Author(s):

R.D. Burnham ◽

D.R. Scifres ◽

W. Streifer

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Single Quantum ◽

Single Quantum Well ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Low-threshold stripe geometry lasers by metalorganic chemical vapour deposition (MO-CVD)

Electronics Letters ◽

10.1049/el:19810501 ◽

1981 ◽

Vol 17 (19) ◽

pp. 714 ◽

Author(s):

R.D. Burnham ◽

D.R. Scifres ◽

W. Streifer

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Threshold ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Diffraction-limited beam operation from quantum-well laser phase-locked array grown by metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19880388 ◽

1988 ◽

Vol 24 (9) ◽

pp. 570 ◽

Author(s):

L.J. Mawst ◽

D. Botez ◽

T.J. Roth ◽

J.J. Yang

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Quantum Well Laser ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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1.3μm GaInAsP/InP buried heterostructure graded index separate confinement multiple quantum well (BH-GRIN-SC-MQW) lasers entirely grown by metalorganic chemical vapour deposition (MOCVD)

Electronics Letters ◽

10.1049/el:19890077 ◽

1989 ◽

Vol 25 (2) ◽

pp. 104 ◽

Author(s):

A. Kasukawa ◽

Y. Imajo ◽

T. Makino

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Multiple Quantum Well ◽

Chemical Vapour ◽

Multiple Quantum ◽

Graded Index ◽

Buried Heterostructure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Low threshold current density operation (J/sub th/ = 340A/cm/sup 2/) of GaInNAs/GaAs quantum well lasers grown by metalorganic chemical vapor deposition

Technical Digest. CLEO/Pacific Rim 2001. 4th Pacific Rim Conference on Lasers and Electro-Optics (Cat. No.01TH8557) ◽

10.1109/cleopr.2001.971100 ◽

2002 ◽

Author(s):

M. Kawaguchi ◽

T. Miyamoto ◽

E. Gouardes ◽

T. Kondo ◽

F. Koyama ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Current Density ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Threshold Current ◽

Threshold Current Density ◽

Low Threshold ◽

Metalorganic Chemical

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