Highly stable silicon dioxide films deposited by means of rapid thermal low‐pressure chemical vapor deposition onto InP
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1990 ◽
Vol 8
(6)
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pp. 1177
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Keyword(s):
1995 ◽
Vol 142
(2)
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pp. 676-682
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1992 ◽
Vol 47
(15-16)
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pp. 3925-3934
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1996 ◽
Vol 143
(5)
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pp. 1715-1718
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