Temperature dependence of growth rate for diamonds grown using a hot filament assisted chemical vapor deposition method at low substrate temperatures

Applied Physics Letters ◽

10.1063/1.111918 ◽

1994 ◽

Vol 64 (10) ◽

pp. 1306-1308 ◽

Author(s):

A. Yamaguchi ◽

M. Ihara ◽

H. Komiyama

Keyword(s):

Growth Rate ◽

Chemical Vapor Deposition ◽

Temperature Dependence ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Hot Filament ◽

Substrate Temperatures

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High-quality diamond film deposition on a titanium substrate using the hot-filament chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/j.diamond.2006.12.016 ◽

2007 ◽

Vol 16 (8) ◽

pp. 1530-1540 ◽

Author(s):

Liang Guo ◽

Guohua Chen

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Titanium Substrate ◽

Chemical Vapor ◽

Film Deposition ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

High Quality ◽

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Synthesis of carbon nanotubes grown by hot filament plasma-enhanced chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/j.diamond.2003.11.056 ◽

2004 ◽

Vol 13 (2) ◽

pp. 299-304 ◽

Author(s):

Kyung Ho Jung ◽

Jin-Hyo Boo ◽

Byungyou Hong

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Hot Filament ◽

Synthesis Of Carbon Nanotubes ◽

Filament Plasma

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Temperature dependence of current–voltage characteristics of MoS 2 /Si devices prepared by the chemical vapor deposition method

Microelectronics Reliability ◽

10.1016/j.microrel.2017.10.002 ◽

2017 ◽

Vol 78 ◽

pp. 374-378 ◽

Author(s):

Ting-Hong Su ◽

Chia-Hung Chiang ◽

Yow-Jon Lin

Keyword(s):

Chemical Vapor Deposition ◽

Temperature Dependence ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Current Voltage ◽

Current Voltage Characteristics

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The preparation and properties of nanostructured diamond films deposited by a hot-filament chemical vapor deposition method via continuous ion bombardment

Thin Solid Films ◽

10.1016/j.tsf.2004.04.029 ◽

2004 ◽

Vol 467 (1-2) ◽

pp. 4-9 ◽

Author(s):

Wei Liu ◽

Changzhi Gu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Ion Bombardment ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

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Effectiveness of a hot-filament chemical vapor deposition method for preparation of a boron-doped superconducting diamond film with higher superconducting transition temperature

Diamond and Related Materials ◽

10.1016/j.diamond.2012.02.008 ◽

2012 ◽

Vol 25 ◽

pp. 5-7 ◽

Author(s):

T. Doi ◽

T. Fukaishi ◽

C. Hiramatsu ◽

T. Wakita ◽

M. Hirai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Transition Temperature ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Transition ◽

Deposition Method ◽

Boron Doped ◽

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Variations in structure and emission characteristics of nanostructured carbon films prepared by the hot-filament chemical-vapor-deposition method due to the addition of ammonia in the source

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1527644 ◽

2003 ◽

Vol 21 (1) ◽

pp. 576 ◽

Author(s):

Seungho Choi ◽

Kyung Ho Park ◽

Hyung Jun Han ◽

Kyung Moon Lee ◽

Soonil Lee ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Emission Characteristics ◽

Deposition Method ◽

Nanostructured Carbon ◽

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Homoepitaxial growth of diamond by an advanced hot‐filament chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.354766 ◽

1993 ◽

Vol 74 (3) ◽

pp. 2030-2035 ◽

Author(s):

Eiichi Kondoh ◽

Kenji Tanaka ◽

Tomohiro Ohta

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Homoepitaxial Growth ◽

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Study of the synthesis of tungsten trioxide nanostructured arrays by tungsten hot filament chemical vapor deposition method and their field emission properties

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3292599 ◽

2010 ◽

Vol 28 (2) ◽

pp. C2A98-C2A103 ◽

Author(s):

Di Lu ◽

Bo Liang ◽

Akihisa Ogino ◽

Masaaki Nagatsu

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Tungsten Trioxide ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Field Emission Properties ◽

Hot Filament ◽

Nanostructured Arrays

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Experimental and calculational study on diamond growth by an advanced hot filament chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.351856 ◽

1992 ◽

Vol 72 (2) ◽

pp. 705-711 ◽

Author(s):

Eiichi Kondoh ◽

Tomohiro Ohta ◽

Tohru Mitomo ◽

Kennich Ohtsuka

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Growth ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

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Structural study of diamond film formed on silicon wafer by hot‐filament chemical vapor deposition method

Applied Physics Letters ◽

10.1063/1.112413 ◽

1994 ◽

Vol 65 (25) ◽

pp. 3203-3205 ◽

Author(s):

Jie Yang ◽

Zhangda Lin ◽

Li‐Xin Wang ◽

Sing Jin ◽

Zhe Zhang

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Wafer ◽

Structural Study ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

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