Erratum: “Microscopic characterization of hot-electron spreading and trapping in SiO2 films using ballistic electron emission microscopy” [Appl. Phys. Lett. 73, 1871 (1998)]

1999 ◽  
Vol 74 (3) ◽  
pp. 478-478
Author(s):  
B. Kaczer ◽  
H.-J. Im ◽  
J. P. Pelz ◽  
R. M. Wallace
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