Erratum: “Microscopic characterization of hot-electron spreading and trapping in SiO2 films using ballistic electron emission microscopy” [Appl. Phys. Lett. 73, 1871 (1998)]
1996 ◽
Vol 104-105
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pp. 274-281
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2000 ◽
Vol 44
(4)
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pp. 517-534
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1997 ◽
Vol 15
(3)
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pp. 1351-1357
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