Experimental determination of the magnetic field spectrum in the Helically Symmetric Experiment using passing particle orbits

2001 ◽  
Vol 8 (12) ◽  
pp. 5165-5170 ◽  
Author(s):  
J. N. Talmadge ◽  
V. Sakaguchi ◽  
F. S. B. Anderson ◽  
D. T. Anderson ◽  
A. F. Almagri
1935 ◽  
Vol 13a (6) ◽  
pp. 111-119 ◽  
Author(s):  
Allan C. Young

The results of an experimental determination of the effect of a magnetic held on the dielectric constants of gaseous and liquid oxygen and nitrogen are given. With the gases a balanced resonance method was used, and with the liquids, a special bridge. The only positive result obtained was with gaseous oxygen at a pressure of 100 atm., and this can be accounted for quantitatively by the increased pressure of the oxygen in the magnetic field.


1972 ◽  
Vol 27 (4) ◽  
pp. 597-600 ◽  
Author(s):  
D. Sutter ◽  
L. Charpentier ◽  
H. Dreizler

Abstract The rotational Zeeman-Effect in the microwave spectrum of dimethylketene was investigated at fieldstrengths close to 22 kG. Only ΔJ= 1 rotational transitions with ΔM = ± 1 selection rules did show appreciable splittings due to the magnetic field. From the splittings the diagonal elements of the molecular gr-tensor were determined to be: gaa = ∓ 0.020(3) ; gbb = ∓ 0.0165(8) ; gcc= + 0.0126(5). (Only the relative signs of the g-values are obtained from the experiment). The susceptibility anisotropics were found to be close to zero.


1991 ◽  
Vol 185-189 ◽  
pp. 1809-1810 ◽  
Author(s):  
N. Bontemps ◽  
P.Y. Bertin ◽  
D. Davidov ◽  
P. Monod ◽  
C. Lacour ◽  
...  

2018 ◽  
Vol 28 (4) ◽  
pp. 1-4
Author(s):  
Bruno Douine ◽  
Kevin Berger ◽  
Frederic Trillaud ◽  
Mohamed Elbaa ◽  
El Hadj Ailam

1968 ◽  
Vol 12 ◽  
pp. 601-611
Author(s):  
J. Charles Lloyd

AbstractArgon is commonly used as the sputtering medium for RF sputtering of insulators and is entrapped in the deposits. X-ray emission determination of argon in RF sputtered SiO2 was required as part of a study of the relationships between argon concentration in the deposits and their electrical and physical properties.Concentrations ranging from 0.05 to 7.4 weight % argon were measured in deposits 0.5 to 5μ thick. Two techniques were used for standardization: (1) weight loss of deposits heated for several hours in a helium atmosphere at 600°C; (2) potassium Kα and chlorine Kα measurements on a KCl film of known thickness to infer argon mass/argon Kα net counts. Calibrations made using these procedures agreed to within 10% and are reliable to about ±25% on an absolute basis. Absorption of radiation by the deposits was taken into account and used to correct measured argon intensities for absorption.Sputtering parameters which had major effects on argon concentration were the substrate temperature and the magnetic field applied during sputtering. Argon pressure and RF power were found to have lesser effects.


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