Experimental determination of interfacial-layer thickness from polarization-voltage hysteresis loops in Pb(Zr0.4Ti0.6)O3 thin films

2005 ◽  
Vol 86 (20) ◽  
pp. 202904 ◽  
Author(s):  
A. Q. Jiang ◽  
C. Wang ◽  
B. L. Cheng ◽  
Z. H. Chen
2020 ◽  
Vol 14 (6) ◽  
pp. 2000070 ◽  
Author(s):  
Wensheng Yan ◽  
Yi Guo ◽  
Deski Beri ◽  
Stephan Dottermusch ◽  
Haining Chen ◽  
...  

1991 ◽  
Vol 70 (4) ◽  
pp. 2230-2233 ◽  
Author(s):  
R. Wördenweber ◽  
M. O. Abd‐El‐Hamed ◽  
J. Schneider ◽  
O. Laborde

2017 ◽  
Vol 25 (22) ◽  
pp. 27077 ◽  
Author(s):  
Peter Nestler ◽  
Christiane A. Helm

MRS Advances ◽  
2016 ◽  
Vol 1 (5) ◽  
pp. 369-374 ◽  
Author(s):  
Yoko Takada ◽  
Naoki Okamoto ◽  
Takeyasu Saito ◽  
Kazuo Kondo ◽  
Takeshi Yoshimura ◽  
...  

ABSTRACTWe fabricated ferroelectric (Pb,La)(Zr,Ti)O3 (PLZT) capacitors with Sn:In2O3 (ITO) or Pt top electrodes and investigated the ferroelectric properties of these PLZT capacitors. The shape of polarization–voltage hysteresis loops was essentially unchanged and the decrease in the remnant polarization of the ITO/PLZT/Pt capacitors was smaller than that of the Pt/PLZT/Pt capacitors after annealing with 3% D2 (in N2) at 200°C and 1 Torr (i.e., FGAD). Time of flight secondary mass spectrometry revealed that the D atoms were incorporated into the PLZT film of the Pt/PLZT/Pt capacitors after 3% D2 annealing, resulting in a decrease in the ferroelectric properties. In comparison, no D ion signal was detected in the PLZT film after FGAD for ITO/PLZT/Pt capacitors.


2017 ◽  
Vol 159 ◽  
pp. 00011 ◽  
Author(s):  
Dmitry Feoktistov ◽  
Sergey Misyura ◽  
Anastasia Islamova ◽  
Kseniya Batishcheva

Sign in / Sign up

Export Citation Format

Share Document