Ion attachment mass spectrometry of nonequilibrium atmospheric-pressure pulsed remote plasma for SiO2 etching
Keyword(s):
Keyword(s):
2010 ◽
Vol 21
(2)
◽
pp. 310-316
◽
2017 ◽
Vol 51
(1-2)
◽
pp. 96-110
◽
2015 ◽
Vol 29
(5)
◽
pp. 424-430
◽
1999 ◽
Vol 732
(1)
◽
pp. 55-64
◽
2002 ◽
Vol 16
(7)
◽
pp. 650-654
◽