Ion attachment mass spectrometry of nonequilibrium atmospheric-pressure pulsed remote plasma for SiO2 etching

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Vol 100 (9) ◽  
pp. 093304 ◽  
Author(s):  
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Masafumi Ito ◽  
Tsuyoshi Uehara ◽  
Megumi Nakamura ◽  
Masaru Hori
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2015 ◽  
Vol 29 (5) ◽  
pp. 424-430 ◽  
Author(s):  
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Iiro Kiiski ◽  
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...  

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