Interaction potential for silicon carbide: A molecular dynamics study of elastic constants and vibrational density of states for crystalline and amorphous silicon carbide

2007 ◽  
Vol 101 (10) ◽  
pp. 103515 ◽  
Author(s):  
Priya Vashishta ◽  
Rajiv K. Kalia ◽  
Aiichiro Nakano ◽  
José Pedro Rino
2017 ◽  
Vol 139 (5) ◽  
Author(s):  
Chengcheng Deng ◽  
Xiaoxiang Yu ◽  
Xiaoming Huang ◽  
Nuo Yang

A new way was proposed to enhance the interfacial thermal conductance (ITC) of silicon carbide (SiC) composite through the overlapped carbon nanotubes (CNTs) and intertube atoms. By nonequilibrium molecular dynamics (NEMD) simulations, the dependence of ITC on both the number of intertube atoms and the temperature was studied. It is indicated that the ITC can be significantly enhanced by adding intertube atoms and finally becomes saturated with the increase of the number of intertube atoms. And the mechanism is discussed by analyzing the probability distributions of atomic forces and vibrational density of states (VDOS). This work may provide some guidance on enhancing the ITC of CNT-based composites.


1998 ◽  
Vol 21 (3) ◽  
pp. 217-219 ◽  
Author(s):  
M. A. Grado-Caffaro ◽  
M. Grado-Caffaro

A formulation for the energy-averaged local valence band density of states of amorphous silicon carbide is derived. To this end,sp3-type hybrid orbitals are employed.


2004 ◽  
Vol 449-452 ◽  
pp. 97-100
Author(s):  
Ju Young Kim ◽  
Baik Woo Lee ◽  
Ho Seok Nam ◽  
Dong Il Kwon

Amorphous silicon carbide (a-SiC) films were deposited using molecular dynamics simulations employing the Tersoff potential. The structure and intrinsic stress of a-SiC films changed dramatically with changes in such principal deposition process parameters as substrate temperature and incident energy. Changes in structure and intrinsic stress with deposition process parameters were analyzed.


2007 ◽  
Vol 102 (2) ◽  
pp. 023509 ◽  
Author(s):  
Izabela Szlufarska ◽  
Rajiv K. Kalia ◽  
Aiichiro Nakano ◽  
Priya Vashishta

2005 ◽  
Vol 17 (33) ◽  
pp. 5101-5110 ◽  
Author(s):  
M Makowska-Janusik ◽  
A Kassiba ◽  
J Bouclé ◽  
J-F Bardeau ◽  
S Kodjikian ◽  
...  

2001 ◽  
Vol 664 ◽  
Author(s):  
Shu-Ya Lin

ABSTRACTThe vibrational density of states for the SiH(D) and SiH2(D2) groups in amorphous silicon nitride are calculated. The Si-H(D) bond-stretching modes of the SiH2(D2) groups are found to split, with the Si-D bond-stretching mode having larger splitting. The difference between the Si-D bond-stretching frequency of the SiD group and the Si-D asymmetrical stretching frequency of the SiD2 group has about the same value as that of the Si-H bonds. The differences in the effective masses of the Si-H and Si-D bonds and the degrees of the bond-stretching splitting of the SiH2 and SiD2 groups have compensating effects.


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