Low leakage current gate dielectrics prepared by ion beam assisted deposition for organic thin film transistors

2007 ◽  
Vol 102 (12) ◽  
pp. 126101 ◽  
Author(s):  
Chang Su Kim ◽  
Sung Jin Jo ◽  
Jong Bok Kim ◽  
Seung Yoon Ryu ◽  
Joo Hyon Noh ◽  
...  
2006 ◽  
Vol 89 (9) ◽  
pp. 092101 ◽  
Author(s):  
Sunho Jeong ◽  
Dongjo Kim ◽  
Sul Lee ◽  
Bong-Kyun Park ◽  
Jooho Moon

2019 ◽  
Vol 31 (19) ◽  
pp. 1900917 ◽  
Author(s):  
Felix Dollinger ◽  
Kyung‐Geun Lim ◽  
Yang Li ◽  
Erjuan Guo ◽  
Peter Formánek ◽  
...  

2010 ◽  
Vol 2 (2) ◽  
pp. 214-220 ◽  
Author(s):  
D. Saikia ◽  
R. Sarma ◽  
P. Saikia ◽  
P. K. Saikia

Tetracene thin film transistors with rare earth oxide (Nd2O3) as gate dielectric is reported in this work. Rare earth oxide with high dielectric constant and low leakage current improve the performance of the organic thin film transistors (OTFTs). The fabricated tetracene OTFTs have shown good output characteristics with mobility 0.93x10-4 cm2/V.s, ON-OFF ratio 3.3x102, sub-threshold swing 0.06 V/decade and hole concentration 8.74x1017 cm-3. Keywords: Organic thin film transistors; Tetracene; Rare earth oxide; Trap density. © 2010 JSR Publications. ISSN: 2070-0237 (Print); 2070-0245 (Online). All rights reserved. DOI: 10.3329/jsr.v2i2.4094               J. Sci. Res. 2 (2), 214-220 (2010) 


2008 ◽  
Vol 93 (1) ◽  
pp. 013305 ◽  
Author(s):  
Y. G. Seol ◽  
H. Y. Noh ◽  
S. S. Lee ◽  
J. H. Ahn ◽  
N.-E. Lee

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