Detecting Carbon Monoxide (CO) With Photoacoustic Spectroscopy: The Role of Molecular Collision Dynamics

2009 ◽  
Author(s):  
N. Truong ◽  
S. Büscher ◽  
F. Kühnemann ◽  
Mohamed Abdel Harith
Redox Report ◽  
2010 ◽  
Vol 15 (5) ◽  
pp. 193-201 ◽  
Author(s):  
Tomohisa Takagi ◽  
Yuji Naito ◽  
Kazuhiko Uchiyama ◽  
Toshikazu Yoshikawa

2021 ◽  
Vol 95 (4) ◽  
pp. 1141-1159
Author(s):  
Rong-Jane Chen ◽  
Yu-Hsuan Lee ◽  
Tzu-Hao Chen ◽  
Yu-Ying Chen ◽  
Ya-Ling Yeh ◽  
...  

1997 ◽  
Vol 432 (1-2) ◽  
pp. 1-5 ◽  
Author(s):  
Roberto Gómez ◽  
JoséM. Orts ◽  
Juan M. Feliu ◽  
Jean Clavilier ◽  
Lorena H. Klein

2002 ◽  
Vol 927 (1) ◽  
pp. 27-34 ◽  
Author(s):  
Alexandre A. Steiner ◽  
Luiz G.S. Branco
Keyword(s):  

1975 ◽  
Vol 6 (33) ◽  
pp. no-no
Author(s):  
D. J. S. GUTHRIE ◽  
I. U. KHAND ◽  
G. R. KNOX ◽  
J. KOLLMEIER ◽  
P. L. PAUSON ◽  
...  
Keyword(s):  

2001 ◽  
Vol 688 ◽  
Author(s):  
St. Schneider ◽  
H. Kohlstedt ◽  
R. Waser

AbstractNoble metals like platinum or irdium are used as electrode materials in DRAM or FRAM devices. Their etch process is a challenge as conventional, sputter driven etch processes either result in redeposition problems (fences) or in a severe sloping (loss of dimension control) and are not acceptable for high density integration architectures. The high temperature etch regime offers a solution by increasing the chemical etch component and thus the volatility of the etch products.As previously reported, the platinum etch rate increases exponentially for a chlorine etch process with increasing wafer temperature. In this study we investigate the particular role of carbon monoxide in a Cl2/CO etch process. We find that carbon monoxide additions to a chlorine process boost the chemical component of the platinum etch rate very significantly, exceeding the effects in the chlorine only process regime by far. Additionally we compare these results with a Cl2/O2 and a Cl2/CO2 process chemistry, which are not found to be particularly beneficial.To better understand the etch process we use an energy dispersive quadrupole mass spectrometer for in situ monitoring, attached to the chamber at two different locations. We are able to position the probe orifice at the place of the wafer electrode, to record ion energy and ion mass spectra of species impinging on the wafer plane. A second off axis position allows for etch product monitoring.


Author(s):  
Md. Aejazur Rahman ◽  
Joel N. Glasgow ◽  
Sajid Nadeem ◽  
Vineel P. Reddy ◽  
Ritesh R. Sevalkar ◽  
...  

For centuries, hydrogen sulfide (H2S) was considered primarily as a poisonous gas and environmental hazard. However, with the discovery of prokaryotic and eukaryotic enzymes for H2S production, breakdown, and utilization, H2S has emerged as an important signaling molecule in a wide range of physiological and pathological processes. Hence, H2S is considered a gasotransmitter along with nitric oxide (•NO) and carbon monoxide (CO). Surprisingly, despite having overlapping functions with •NO and CO, the role of host H2S in microbial pathogenesis is understudied and represents a gap in our knowledge. Given the numerous reports that followed the discovery of •NO and CO and their respective roles in microbial pathogenesis, we anticipate a rapid increase in studies that further define the importance of H2S in microbial pathogenesis, which may lead to new virulence paradigms. Therefore, this review provides an overview of sulfide chemistry, enzymatic production of H2S, and the importance of H2S in metabolism and immunity in response to microbial pathogens. We then describe our current understanding of the role of host-derived H2S in tuberculosis (TB) disease, including its influences on host immunity and bioenergetics, and on Mycobacterium tuberculosis (Mtb) growth and survival. Finally, this review discusses the utility of H2S-donor compounds, inhibitors of H2S-producing enzymes, and their potential clinical significance.


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