In situ Auger electron spectroscopy of Si and SiO2 surfaces plasma etched in CF4-H2 glow discharges

1979 ◽  
Vol 50 (8) ◽  
pp. 5210 ◽  
Author(s):  
J. W. Coburn
2015 ◽  
Vol 425 ◽  
pp. 2-4 ◽  
Author(s):  
S.P. Svensson ◽  
W.L. Sarney ◽  
K.M. Yu ◽  
M. Ting ◽  
W.L. Calley ◽  
...  

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