Deep levels introduced into silicon during hydrogen plasma annealing

Journal of Applied Physics ◽

10.1063/1.335270 ◽

1985 ◽

Vol 57 (12) ◽

pp. 5275-5278 ◽

Author(s):

J. M. Hwang ◽

D. K. Schroder ◽

W. J. Biter

Keyword(s):

Hydrogen Plasma ◽

Deep Levels ◽

Plasma Annealing

Download Full-text

Conduction via deep levels in hydrogen plasma treated Au-Si Schottky structures

2000 International Semiconductor Conference. 23rd Edition. CAS 2000 Proceedings (Cat. No.00TH8486) ◽

10.1109/smicnd.2000.890207 ◽

2002 ◽

Author(s):

S. Simeonov ◽

E. Kafedjiiska ◽

A. Szekeres

Keyword(s):

Hydrogen Plasma ◽

Download Full-text

In situ observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing

Journal of Applied Physics ◽

10.1063/1.369242 ◽

1999 ◽

Vol 85 (2) ◽

pp. 1172-1177 ◽

Author(s):

Ryoichi Nozawa ◽

Hirohisa Takeda ◽

Masafumi Ito ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogen Plasma ◽

Hydrogenated Amorphous Silicon ◽

Silicon Surfaces ◽

In Situ Observation ◽

Hydrogenated Amorphous ◽

Plasma Annealing

Download Full-text

Stable field emission with low threshold field from amorphous carbon films due to layer-by-layer hydrogen plasma annealing

Journal of Applied Physics ◽

10.1063/1.1464211 ◽

2002 ◽

Vol 91 (8) ◽

pp. 5434-5437 ◽

Author(s):

Jun Xu ◽

Xiaohui Huang ◽

Wei Li ◽

Kunji Chen ◽

Jianbin Xu

Keyword(s):

Field Emission ◽

Amorphous Carbon ◽

Hydrogen Plasma ◽

Carbon Films ◽

Threshold Field ◽

Layer By Layer ◽

Amorphous Carbon Films ◽

Low Threshold ◽

Stable Field ◽

Plasma Annealing

Download Full-text

Thermal and hydrogen plasma annealing of amorphous hydrogenated carbon

Solid State Communications ◽

10.1016/0038-1098(91)90708-4 ◽

1991 ◽

Vol 80 (6) ◽

pp. 371-372 ◽

Author(s):

Shuhan Lin ◽

Bernard J. Feldman

Keyword(s):

Hydrogen Plasma ◽

Amorphous Hydrogenated Carbon ◽

Plasma Annealing

Download Full-text

RF hydrogen plasma influence on shallow and deep levels in crystalline silicon

Hydrogen in Semiconductors ◽

10.1016/b978-0-444-89138-9.50030-9 ◽

1991 ◽

pp. 231-234 ◽

Author(s):

A. Szekeres ◽

S.S. Simeonov ◽

E. Kafedjiiska

Keyword(s):

Crystalline Silicon ◽

Hydrogen Plasma ◽

Download Full-text

Effect of r.f. hydrogen plasma annealing on the properties of Si/SiO2 interface: a spectroscopic ellipsometry study

Thin Solid Films ◽

10.1016/s0040-6090(03)00394-8 ◽

2003 ◽

Vol 433 (1-2) ◽

pp. 367-370 ◽

Author(s):

A. Paneva ◽

A. Szekeres

Keyword(s):

Spectroscopic Ellipsometry ◽

Hydrogen Plasma ◽

Plasma Annealing

Download Full-text

Influence of Applied Power in Microwave Hydrogen Plasma Annealing on Aluminum doped Zinc Oxide/Tin doped Indium Oxide Bilayer Films for Low Emissivity Application

2018 13th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT) ◽

10.1109/impact.2018.8625750 ◽

2018 ◽

Author(s):

Shang-Chou Chang ◽

Tsung Han Li ◽

Yun-Zen Liao ◽

Yu-Kai Luo ◽

Yi-Lin Shen ◽

...

Keyword(s):

Indium Oxide ◽

Hydrogen Plasma ◽

Bilayer Films ◽

Aluminum Doped Zinc Oxide ◽

Plasma Annealing

Download Full-text

Effects of hydrogen plasma annealing on the luminescence from a-Si:H/SiO2 and nc-Si/SiO2 multilayers

Applied Surface Science ◽

10.1016/j.apsusc.2007.04.058 ◽

2007 ◽

Vol 253 (21) ◽

pp. 8647-8651 ◽

Author(s):

Yunjun Rui ◽

Deyuan Chen ◽

Jun Xu ◽

Wei Li ◽

Zhanhong Cen ◽

...

Keyword(s):

Hydrogen Plasma ◽

Plasma Annealing

Download Full-text

High-quality a-SiGe:H produced by nanometer deposition and hydrogen plasma annealing

10.1109/icsict.1995.500191 ◽

2002 ◽

Author(s):

Jun Xu ◽

S. Miyazaki ◽

M. Hirose ◽

Kunji Chen ◽

Duan Feng

Keyword(s):

Hydrogen Plasma ◽

High Quality ◽

Plasma Annealing

Download Full-text

Preparation of CoSi2 using microwave hydrogen plasma annealing

10.1117/12.608042 ◽

2004 ◽

Author(s):

Tao Wang ◽

Yong B. Dai ◽

S. K. Ouyang ◽

He S. Shen ◽

Jian S. Wu

Keyword(s):

Hydrogen Plasma ◽

Plasma Annealing

Download Full-text