Stable field emission with low threshold field from amorphous carbon films due to layer-by-layer hydrogen plasma annealing

2002 ◽  
Vol 91 (8) ◽  
pp. 5434-5437 ◽  
Author(s):  
Jun Xu ◽  
Xiaohui Huang ◽  
Wei Li ◽  
Kunji Chen ◽  
Jianbin Xu
Keyword(s):  
Field Emission ◽  
Amorphous Carbon ◽  
Hydrogen Plasma ◽  
Carbon Films ◽  
Threshold Field ◽  
Layer By Layer ◽  
Amorphous Carbon Films ◽  
Low Threshold ◽  
Stable Field ◽  
Plasma Annealing

VERY LOW THRESHOLD ELECTRON FIELD EMISSION FROM AMORPHOUS CARBON FILMS WITH HYDROGEN DILUTION

2002 ◽  
Vol 16 (06n07) ◽  
pp. 988-992
Author(s):  
JUN XU ◽  
XIAOHUI HUANG ◽  
WEI LI ◽  
LI WANG ◽  
KUNJI CHEN ◽  
...  
Keyword(s):  
Field Emission ◽  
Amorphous Carbon ◽  
Carbon Film ◽  
Carbon Films ◽  
Enhancement Effect ◽  
Parallel Plates ◽  
Test Configuration ◽  
Amorphous Carbon Films ◽  
Hydrogen Dilution ◽  
Low Threshold

Hydrogenated amorphous carbon films were fabricated with and without hydrogen dilution in a small d.c bias-assisted plasma chemical vapor deposition system. It was found that the hydrogen dilution can reduce the sp 2/ sp 3 ratio in carbon films which results in blue shift of room temperature photoluminescence spectrum. The field emission characteristics were investigated by using parallel plates test configuration. A very low threshold electric field (~0.5 V/μm) was achieved from thin amorphous carbon film prepared with hydrogen dilution. The improvement to field emission property in the present carbon films was tentatively attributed to the field enhancement effect due to the electronic structure inhomogeneity of the carbon films and the reduction of the surface emission barrier due to the hydrogen termination.

A Field Emission Study of the Critical Parameters of Amorphous Carbon Films Deposited on a Variety of Carbonaceous Substrates

1997 ◽  
Vol 498 ◽  
Author(s):  
A. P. Burden ◽  
R. Forrest ◽  
S.R.P. Silva ◽  
B. J. Sealy ◽  
G.A.J. Amaratunga
Keyword(s):  
Film Thickness ◽  
Field Emission ◽  
Amorphous Carbon ◽  
Field Enhancement ◽  
Carbon Films ◽  
Critical Parameters ◽  
Fully Depleted ◽  
Amorphous Carbon Films ◽  
Field Emission Properties ◽  
Pre Treatment

ABSTRACTThe field emission properties of a variety of nitrogen-containing hydrogenated amorphous carbon films have been characterised as a function of film thickness and substrate type. Identified trends have been discussed in terms of the optical band-gap and refractive index of the films, and the surface roughness of the substrates. In addition, carbon-based materials have been considered as inexpensive film-compatible substrates, and an in-situ oxygen plasma pre-treatment has been investigated as a means of changing the field enhancement factor of the system. We have achieved field emission with threshold voltages as low as 8 V μm−1, and we present data that supports the view that the electron emission from amorphous carbon is dependent on the nature of the back contact, and possibly the ease at which the film can be fully depleted, i.e. film thickness.

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