Growth of microcrystalline silicon by remote plasma chemical vapor deposition without hydrogen dilution

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Remote Plasma ◽

Plasma Chemical ◽

Hydrogen Dilution

Growth of microcrystalline silicon film by electron beam excited plasma chemical vapor deposition without hydrogen dilution

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581471 ◽

1998 ◽

Vol 16 (5) ◽

pp. 3134-3137 ◽

Cited By ~ 12

Author(s):

Mitsuru Imaizumi ◽

Kazuhiko Okitsu ◽

Masafumi Yamaguchi ◽

Tamio Hara ◽

Tadashi Ito ◽

...

Keyword(s):

Electron Beam ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Hydrogen Dilution ◽

Microcrystalline Silicon Film

Growth of microcrystal silicon by remote plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.104661 ◽

1991 ◽

Vol 58 (3) ◽

pp. 281-283 ◽

Cited By ~ 25

Author(s):

Sung Chul Kim ◽

Moon Hyun Jung ◽

Jin Jang

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

10.1116/1.590013 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1087 ◽

Cited By ~ 3

Author(s):

M. Hernández Vélez

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Remote Plasma ◽

Plasma Chemical ◽

Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon-Carbon and Silica Films from Organosilicon Sources.

Chemistry of Materials ◽

10.1021/cm012004o ◽

2001 ◽

Vol 13 (8) ◽

pp. 2742-2742 ◽

Cited By ~ 2

Author(s):

A. M. Wróbel ◽

A. Walkiewicz-Pietrzykowska ◽

Y. Hatanaka ◽

S. Wickramanayaka ◽

Y. Nakanishi

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Silica Films ◽

Silicon Carbon

Molybdenum contamination in low‐temperature epitaxial silicon films grown by remote plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.118090 ◽

1996 ◽

Vol 69 (1) ◽

pp. 109-111 ◽

Cited By ~ 3

Author(s):

R. Sharma ◽

J. Fretwell ◽

B. Doris ◽

S. Banerjee

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Epitaxial Silicon ◽

Remote Plasma ◽

Plasma Chemical ◽

Remote plasma chemical vapor deposition for high-efficiency ultra-thin ∼25-microns crystalline Si solar cells

2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2 ◽

10.1109/pvsc-vol2.2013.6656713 ◽

2013 ◽

Author(s):

D. Sarkar ◽

E. U. Onyegam ◽

S. Saha ◽

L. Mathew ◽

R. A. Rao ◽

...

Keyword(s):

Solar Cells ◽

Vapor Deposition ◽

High Efficiency ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Si Solar Cells

Growth of GexSi1−x/Si heteroepitaxial films by remote plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578116 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1920-1926 ◽

Cited By ~ 2

Author(s):

R. Qian ◽

D. Kinosky ◽

T. Hsu ◽

J. Irby ◽

A. Mahajan ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

New insights in microcrystalline silicon deposition with expanding thermal plasma chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2005.11.109 ◽

2006 ◽

Vol 352 (9-20) ◽

pp. 933-936 ◽

Cited By ~ 3

Author(s):

R.A.C.M.M. van Swaaij ◽

R. Jiménez Zambrano ◽

C. Smit ◽

M.C.M. van de Sanden

Keyword(s):

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Silicon Deposition ◽

Numerical Simulation of Plasma Chemical Vapor Deposition from Silane: Effects of the Plasma-Substrate Distance and Hydrogen Dilution

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.3396 ◽

1997 ◽

Vol 36 (Part 1, No. 6A) ◽

pp. 3396-3407 ◽

Cited By ~ 8

Author(s):

Motoaki Kawase ◽

Tsuyoshi Nakai ◽

Akimasa Yamaguchi ◽

Tomohiro Hakozaki ◽

Kenji Hashimoto

Keyword(s):

Numerical Simulation ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Substrate Distance ◽

Hydrogen Dilution

Excitation energy dependence of photoluminescence in nanocrystalline silicon deposited by remote plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(98)00875-x ◽

1998 ◽

Vol 335 (1-2) ◽

pp. 266-269 ◽

Cited By ~ 7

Author(s):

Suk-Ho Choi ◽

Shin Hey Won ◽

Jin Jang

Keyword(s):

Excitation Energy ◽

Energy Dependence ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Remote Plasma ◽

Plasma Chemical ◽