Effect of high-pressure oxygen annealing on negative bias illumination stress-induced instability of InGaZnO thin film transistors

2011 ◽  
Vol 98 (10) ◽  
pp. 103509 ◽  
Author(s):  
Kwang Hwan Ji ◽  
Ji-In Kim ◽  
Hong Yoon Jung ◽  
Se Yeob Park ◽  
Rino Choi ◽  
...  
Keyword(s):  
Thin Film ◽  
High Pressure ◽  
Thin Film Transistors ◽  
Negative Bias ◽  
Oxygen Annealing ◽  
Pressure Oxygen ◽  
High Pressure Oxygen ◽  
Negative Bias Illumination Stress

Effects of high pressure oxygen annealing on Hf0.5Zr0.5O2 ferroelectric device

2021 ◽  
Author(s):  
Hyungwoo Kim ◽  
Alireza Kashir ◽  
Seungyeol Oh ◽  
Hojung Jang ◽  
Hyunsang Hwang
Keyword(s):  
High Pressure ◽  
Oxygen Annealing ◽  
Pressure Oxygen ◽  
High Pressure Oxygen

Effect of Bandgap Widening on Negative-Bias Illumination Stress Stability of Oxide Thin-Film Transistors

2021 ◽  
Vol 68 (9) ◽  
pp. 4450-4454
Author(s):  
Caihao Deng ◽  
Linfeng Lan ◽  
Penghui He ◽  
Yaping Li ◽  
Xiao Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Oxide Thin Film ◽  
Negative Bias ◽  
Negative Bias Illumination Stress

scholarly journals Quantitative analysis of annealing-induced instabilities of photo-leakage current and negative-bias-illumination-stress in a-InGaZnO thin-film transistors

2019 ◽  
Vol 10 ◽  
pp. 1125-1130 ◽  
Author(s):  
Dapeng Wang ◽  
Mamoru Furuta
Keyword(s):  
Thin Film ◽  
High Temperature ◽  
Low Temperature ◽  
Leakage Current ◽  
Thin Film Transistors ◽  
Temperature Treatment ◽  
Treatment Temperature ◽  
Negative Bias ◽  
Indium Gallium Zinc Oxide ◽  
Negative Bias Illumination Stress

This study examines the effect of the annealing temperature on the initial electrical characteristics and photo-induced instabilities of amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs). The extracted electrical parameters from transfer curves suggest that a low-temperature treatment maintains a high density of defects in the IGZO bulk, whereas high-temperature annealing causes a quality degradation of the adjacent interfaces. Light of short wavelengths below 460 nm induces defect generation in the forward measurement and the leakage current increases in the reverse measurement, especially for the low-temperature-annealed device. The hysteresis after negative-bias-illumination-stress (NBIS) is quantitatively investigated by using the double-scan mode and a positive gate pulse. Despite the abnormal transfer properties in the low-temperature-treated device, the excited holes are identically trapped at the front interface irrespective of treatment temperature. NBIS-induced critical instability occurs in the high-temperature-annealed TFT.

Reducing dielectric loss in CaCu3Ti4O12 thin films by high-pressure oxygen annealing

2015 ◽  
Vol 3 (14) ◽  
pp. 3438-3444 ◽  
Author(s):  
Y. Lin ◽  
D. Y. Feng ◽  
M. Gao ◽  
Y. D. Ji ◽  
L. B. Jin ◽  
...  
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Dielectric Loss ◽  
Oxygen Annealing ◽  
Pressure Oxygen ◽  
High Pressure Oxygen ◽  
Strain Status

High pressure oxygen annealing could reduce the dielectric loss in CCTO films as well as induce obvious difference in strain status.

Effect of High-Pressure Oxygen Annealing on Bi2SiO5-Added Ferroelectric Thin Films

2002 ◽  
Vol 41 (Part 2, No. 10B) ◽  
pp. L1164-L1166 ◽  
Author(s):  
Takeshi Kijima ◽  
Yoshihito Kawashima ◽  
Yasushi Idemoto ◽  
Hiroshi Ishiwara
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Ferroelectric Thin Films ◽  
Oxygen Annealing ◽  
Pressure Oxygen ◽  
High Pressure Oxygen
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