Atomic configuration of the interface between epitaxial Gd doped HfO2 high k thin films and Ge (001) substrates

2012 ◽  
Vol 111 (1) ◽  
pp. 014102 ◽  
Author(s):  
Xinqiang Zhang ◽  
Hailing Tu ◽  
Yiwen Guo ◽  
Hongbin Zhao ◽  
Mengmeng Yang ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Configuration ◽  
High K

Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

2021 ◽  
Vol MA2021-02 (12) ◽  
pp. 626-626
Author(s):  
Chia-Han Yang ◽  
Yue Kuo
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
High K

scholarly journals Atomic scale microstructures of high-k HfSiO thin films fabricated by magnetron sputtering

2012 ◽  
Vol 177 (10) ◽  
pp. 717-720 ◽  
Author(s):  
Etienne Talbot ◽  
Manuel Roussel ◽  
Larysa Khomenkova ◽  
Fabrice Gourbilleau ◽  
Philippe Pareige
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Atomic Scale ◽  
High K

scholarly journals Influence of local atomic configuration in AlGdN phosphor thin films on deep ultra-violet luminescence intensity

2011 ◽  
Vol 110 (9) ◽  
pp. 093108 ◽  
Author(s):  
Shinya Kitayama ◽  
Hiroaki Yoshitomi ◽  
Shinya Iwahashi ◽  
Junya Nakamura ◽  
Takashi Kita ◽  
...  
Keyword(s):  
Thin Films ◽  
Luminescence Intensity ◽  
Ultra Violet ◽  
Atomic Configuration ◽  
Violet Luminescence ◽  
Local Atomic Configuration

Investigation of strontium tantalate thin films for high-k gate dielectric applications

2006 ◽  
Vol 9 (6) ◽  
pp. 1102-1107 ◽  
Author(s):  
M. Silinskas ◽  
M. Lisker ◽  
B. Kalkofen ◽  
E.P. Burte
Keyword(s):  
Thin Films ◽  
Gate Dielectric ◽  
High K ◽  
High K Gate Dielectric

A Simple Route to the Synthesis of Pr2O3 High-k Thin Films

2003 ◽  
Vol 15 (13) ◽  
pp. 1071-1075 ◽  
Author(s):  
R. Lo Nigro ◽  
R.G. Toro ◽  
G. Malandrino ◽  
V. Raineri ◽  
I.L. Fragalà
Keyword(s):  
Thin Films ◽  
Simple Route ◽  
High K

Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

2021 ◽  
Vol 104 (3) ◽  
pp. 63-67
Author(s):  
Chia-Han Yang ◽  
Yue Kuo
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
High K

High-k ZrO2 dielectric thin films on GaAs semiconductor with reduced regrowth of native oxides by atomic layer deposition

2013 ◽  
Vol 583 ◽  
pp. 74-79 ◽  
Author(s):  
R.B. Konda ◽  
C. White ◽  
J. Smak ◽  
R. Mundle ◽  
M. Bahoura ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dielectric Thin Films ◽  
Native Oxides ◽  
Layer Deposition ◽  
High K

Substrate biasing effect on the electrical properties of magnetron-sputtered high-k titanium silicate thin films

2007 ◽  
Vol 102 (3) ◽  
pp. 034106 ◽  
Author(s):  
D. Brassard ◽  
M. A. El Khakani ◽  
L. Ouellet
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Titanium Silicate ◽  
High K

Stability of High-k Thin Films in Moisture Ambience - The Effect of Dissolution Gas from Acryl Apparatus -

2002 ◽  
Author(s):  
S. Akama ◽  
A. Kikuchi ◽  
J. Tonotani ◽  
S.-I. Ohmi ◽  
H. Iwai
Keyword(s):  
Thin Films ◽  
High K
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