High-k ZrO2 dielectric thin films on GaAs semiconductor with reduced regrowth of native oxides by atomic layer deposition

2013 ◽  
Vol 583 ◽  
pp. 74-79 ◽  
Author(s):  
R.B. Konda ◽  
C. White ◽  
J. Smak ◽  
R. Mundle ◽  
M. Bahoura ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dielectric Thin Films ◽  
Native Oxides ◽  
Layer Deposition ◽  
High K

Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3gate dielectric thin films

2015 ◽  
Vol 12 (7) ◽  
pp. 980-984 ◽  
Author(s):  
Emanuela Schilirò ◽  
Giuseppe Greco ◽  
Patrick Fiorenza ◽  
Cristina Tudisco ◽  
Guglielmo Guido Condorelli ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dielectric Thin Films ◽  
Layer Deposition ◽  
Semiconductor Substrates ◽  
Surface Nature

Characterization and electrical properties of high-k GdScO3 thin films grown by atomic layer deposition

2007 ◽  
Vol 88 (4) ◽  
pp. 633-637 ◽  
Author(s):  
P. Myllymäki ◽  
M. Roeckerath ◽  
M. Putkonen ◽  
S. Lenk ◽  
J. Schubert ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
High K
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