scholarly journals Initial nucleation site formation due to acoustic droplet vaporization

2014 ◽  
Vol 104 (6) ◽  
pp. 063703 ◽  
Author(s):  
David S. Li ◽  
Oliver D. Kripfgans ◽  
Mario L. Fabiilli ◽  
J. Brian Fowlkes ◽  
Joseph L. Bull
2005 ◽  
Vol 870 ◽  
Author(s):  
C. G. Allen ◽  
J. D. Beach ◽  
A. A. Khandekar ◽  
J. C. Dorr ◽  
C. Veauvy ◽  
...  

AbstractA method for depositing large grained polycrystalline GaAs on lattice mismatched substrates through controlled nucleation and selective growth is presented. The process was developed on Si wafers. Nucleation site formation began with nanolithography to create submicron holes in photoresist on Si. Ga metal was electrochemically deposited into the holes. Subsequent arsine anneals converted the gallium deposits into GaAs. Photoluminescence and electron diffraction verified conversion to GaAs. Metal-Organic Chemical Vapor Deposition (MOCVD) enlarged the seed crystals to coalescence without creating additional nucleation sites within the patterned field. Having successfully demonstrated the approach, subsequent work has been directed at lower cost, alternative ways to define initial nucleation sites, such as, microcontact lithography and direct decomposition of triethyl gallium to Ga metal in the MOCVD chamber.


2002 ◽  
Vol 739 ◽  
Author(s):  
Meg Abraham ◽  
Inmaculada Gomez-Morilla ◽  
Mike Marsh ◽  
Geoff Grime

ABSTRACTThe use of photons to create intricate three-dimensional and buried structures [1] in photo-structurable glass has been well demonstrated at several institutions [2]. In these instances the glass used whether it be Foturan™, made by the Schott Group or a similar product made by Corning Glass, forms a silver nucleation sites on exposure to intense UV laser light via a two-photon process. Subsequent annealing causes a localized crystal growth to form a meta-silicate phase which can be etched in dilute hydrofluoric acid at rates of 20 to 50 times that of the unprocessed glass. The same formulation of glass can be “exposed” using a particle beam to create the nucleation site. In the case of particle beam exposure, experiments have shown that the mechanisms that cause this initial nucleation and eventual stochiometric transformation, after annealing, depend largely on the beam energy.


Author(s):  
Man Zhang ◽  
Mario Fabiilli ◽  
Paul Carson ◽  
Frederic Padilla ◽  
Scott Swanson ◽  
...  

2012 ◽  
Vol 19 (6) ◽  
pp. 501-509 ◽  
Author(s):  
STANLEY SAMUEL ◽  
AMBROISE DUPREY ◽  
MARIO L. FABIILLI ◽  
JOSEPH L. BULL ◽  
JEFFREY BRIAN FOWLKES

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