Formation of size controlled silicon nanocrystals in nitrogen free silicon dioxide matrix prepared by plasma enhanced chemical vapor deposition

2014 ◽  
Vol 116 (22) ◽  
pp. 223501 ◽  
Author(s):  
J. Laube ◽  
S. Gutsch ◽  
D. Hiller ◽  
M. Bruns ◽  
C. Kübel ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Silicon Nanocrystals ◽  
Chemical Vapor ◽  
Free Silicon ◽  
Silicon Dioxide Matrix ◽  
Size Controlled

Formation of size-controlled silicon nanocrystals in plasma enhanced chemical vapor deposition grown SiOxNy/SiO2 superlattices

2011 ◽  
Vol 520 (1) ◽  
pp. 121-125 ◽  
Author(s):  
A.M. Hartel ◽  
D. Hiller ◽  
S. Gutsch ◽  
P. Löper ◽  
S. Estradé ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Nanocrystals ◽  
Chemical Vapor ◽  
Size Controlled

Chemical Vapor Deposition of Hydrogen-Free Silicon-Dioxide Films

1997 ◽  
Vol 36 (Part 1, No. 3B) ◽  
pp. 1509-1512 ◽  
Author(s):  
Yasutaka Uchida ◽  
Shu Takei ◽  
Masakiyo Matsumura
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Free Silicon ◽  
Silicon Dioxide Films

Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane

1993 ◽  
Vol 5 (12) ◽  
pp. 1710-1714 ◽  
Author(s):  
R. A. Levy ◽  
J. M. Grow ◽  
G. S. Chakravarthy
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical
Sign in / Sign up

Export Citation Format

Share Document