scholarly journals Microstructure fabrication process induced modulations in CVD graphene

AIP Advances ◽  
2014 ◽  
Vol 4 (12) ◽  
pp. 127143 ◽  
Author(s):  
Akitomo Matsubayashi ◽  
Zhenjun Zhang ◽  
Ji Ung Lee ◽  
Vincent P. LaBella
2019 ◽  
Vol 2019 ◽  
pp. 1-5
Author(s):  
Sung Ho Lee ◽  
Cheol Woo Park ◽  
Moon Kyu Kwak

In this paper, we report a new method for continuous fabrication of dry adhesives composed of microstructures with mushroom-shaped ends. Conventional mushroom microstructure fabrication is performed with a simple molding technique using a reversed phase master. In a typical fabrication process, thin- and wide-tip portions may be ripped during demolding, making it difficult to use in a continuous process. It is also difficult to apply the mushroom structure master to a continuous process system in roll form. Here, a continuous fabrication process was developed by applying the method of fabricating a wide tip using a tip inking method after forming a micropillar. Through the continuous process, the dry adhesive was successfully fabricated and the durability was measured with a reasonable pull-off strength (13 N/cm2). In addition to the reasonable adhesion, high durability is guaranteed, and fabricated dry adhesives are expected to be used in various fields.


Author(s):  
M.G. Rosenfield

Minimum feature sizes in experimental integrated circuits are approaching 0.5 μm and below. During the fabrication process it is usually necessary to be able to non-destructively measure the critical dimensions in resist and after the various process steps. This can be accomplished using the low voltage SEM. Submicron linewidth measurement is typically done by manually measuring the SEM micrographs. Since it is desirable to make as many measurements as possible in the shortest period of time, it is important that this technique be automated.Linewidth measurement using the scanning electron microscope is not well understood. The basic intent is to measure the size of a structure from the secondary electron signal generated by that structure. Thus, it is important to understand how the actual dimension of the line being measured relates to the secondary electron signal. Since different features generate different signals, the same method of relating linewidth to signal cannot be used. For example, the peak to peak method may be used to accurately measure the linewidth of an isolated resist line; but, a threshold technique may be required for an isolated space in resist.


Author(s):  
Noriyuki Nomoto ◽  
Yoshitomi Okazaki ◽  
Kenji Kuroda ◽  
Shunji Takenoiri ◽  
Toyonobu Yoshida

2019 ◽  
Vol 215 ◽  
pp. 04001 ◽  
Author(s):  
Angelina Müller ◽  
Matthias C. Wapler ◽  
Ulrike Wallrabe

We present a rapid-prototyping process to fabricate aspherical lens arrays based on surface deformation due to thermal expansion of PDMS. Using laser-structuring and molding in combination with an FEM-based shape optimization, we were able to design, fabricate and characterize different micro-lens arrays. This fabrication process can be used for almost any kind of arbitrary lens shape, which allows for a large design freedom for micro lenses.


Author(s):  
Marshall Quinn ◽  
Ugo Lafont ◽  
Johan Versteegh ◽  
Jian Guo

RSC Advances ◽  
2021 ◽  
Vol 11 (31) ◽  
pp. 18994-18999
Author(s):  
Linzhi Li ◽  
Tianzeng Huang ◽  
Saijun He ◽  
Xing Liu ◽  
Qi Chen ◽  
...  

The fabrication process of the nonenzyme glucose sensing based Cu2+–Cu+/biochar.


Sign in / Sign up

Export Citation Format

Share Document