scholarly journals Microstructure fabrication process induced modulations in CVD graphene

AIP Advances ◽  
2014 ◽  
Vol 4 (12) ◽  
pp. 127143 ◽  
Author(s):  
Akitomo Matsubayashi ◽  
Zhenjun Zhang ◽  
Ji Ung Lee ◽  
Vincent P. LaBella
Keyword(s):  
Fabrication Process ◽  
Cvd Graphene ◽  
Microstructure Fabrication

scholarly journals A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors

2016 ◽  
Author(s):  
S. Vollebregt ◽  
B. Alfano ◽  
F. Ricciardella ◽  
A. J. M. Giesbers ◽  
Y. Grachova ◽  
...  
Keyword(s):  
Fabrication Process ◽  
Wafer Scale ◽  
Cvd Graphene

scholarly journals Continuous Fabrication of Wide-Tip Microstructures for Bio-Inspired Dry Adhesives via Tip Inking Process

2019 ◽  
Vol 2019 ◽  
pp. 1-5
Author(s):  
Sung Ho Lee ◽  
Cheol Woo Park ◽  
Moon Kyu Kwak
Keyword(s):  
Continuous Process ◽  
Reversed Phase ◽  
Fabrication Process ◽  
New Method ◽  
Dry Adhesive ◽  
Microstructure Fabrication ◽  
High Durability ◽  
Dry Adhesives ◽  
Process System ◽  
Continuous Fabrication

In this paper, we report a new method for continuous fabrication of dry adhesives composed of microstructures with mushroom-shaped ends. Conventional mushroom microstructure fabrication is performed with a simple molding technique using a reversed phase master. In a typical fabrication process, thin- and wide-tip portions may be ripped during demolding, making it difficult to use in a continuous process. It is also difficult to apply the mushroom structure master to a continuous process system in roll form. Here, a continuous fabrication process was developed by applying the method of fabricating a wide tip using a tip inking method after forming a micropillar. Through the continuous process, the dry adhesive was successfully fabricated and the durability was measured with a reasonable pull-off strength (13 N/cm2). In addition to the reasonable adhesion, high durability is guaranteed, and fabricated dry adhesives are expected to be used in various fields.

Linewidth measurement using the low voltage SEM

1986 ◽  
Vol 44 ◽  
pp. 652-653
Author(s):  
M.G. Rosenfield
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Integrated Circuits ◽  
Secondary Electron ◽  
Low Voltage ◽  
Fabrication Process ◽  
Critical Dimensions ◽  
Linewidth Measurement ◽  
Threshold Technique ◽  
Scanning Electron

Minimum feature sizes in experimental integrated circuits are approaching 0.5 μm and below. During the fabrication process it is usually necessary to be able to non-destructively measure the critical dimensions in resist and after the various process steps. This can be accomplished using the low voltage SEM. Submicron linewidth measurement is typically done by manually measuring the SEM micrographs. Since it is desirable to make as many measurements as possible in the shortest period of time, it is important that this technique be automated.Linewidth measurement using the scanning electron microscope is not well understood. The basic intent is to measure the size of a structure from the secondary electron signal generated by that structure. Thus, it is important to understand how the actual dimension of the line being measured relates to the secondary electron signal. Since different features generate different signals, the same method of relating linewidth to signal cannot be used. For example, the peak to peak method may be used to accurately measure the linewidth of an isolated resist line; but, a threshold technique may be required for an isolated space in resist.

INTEGRATED FABRICATION PROCESS FOR SOLID OXIDE FUELCELLS USING HYBRID PLASMA SPRAYING

1997 ◽  
Vol 1 (1) ◽  
pp. 41-47 ◽  
Author(s):  
Noriyuki Nomoto ◽  
Yoshitomi Okazaki ◽  
Kenji Kuroda ◽  
Shunji Takenoiri ◽  
Toyonobu Yoshida
Keyword(s):  
Plasma Spraying ◽  
Solid Oxide ◽  
Fabrication Process ◽  
Hybrid Plasma

scholarly journals Economical rapid-prototyping of aspherical lenses

2019 ◽  
Vol 215 ◽  
pp. 04001 ◽  
Author(s):  
Angelina Müller ◽  
Matthias C. Wapler ◽  
Ulrike Wallrabe
Keyword(s):  
Thermal Expansion ◽  
Rapid Prototyping ◽  
Shape Optimization ◽  
Surface Deformation ◽  
Fabrication Process ◽  
Aspherical Lens ◽  
Laser Structuring ◽  
Aspherical Lenses ◽  
Design Freedom ◽  
Micro Lens

We present a rapid-prototyping process to fabricate aspherical lens arrays based on surface deformation due to thermal expansion of PDMS. Using laser-structuring and molding in combination with an FEM-based shape optimization, we were able to design, fabricate and characterize different micro-lens arrays. This fabrication process can be used for almost any kind of arbitrary lens shape, which allows for a large design freedom for micro lenses.

Effect of low vacuum environment on the fused filament fabrication process

2021 ◽  
Author(s):  
Marshall Quinn ◽  
Ugo Lafont ◽  
Johan Versteegh ◽  
Jian Guo
Keyword(s):  
Fabrication Process ◽  
Fused Filament Fabrication

scholarly journals Waste eggshell membrane-templated synthesis of functional Cu2+–Cu+/biochar for an ultrasensitive electrochemical enzyme-free glucose sensor

RSC Advances ◽  
2021 ◽  
Vol 11 (31) ◽  
pp. 18994-18999
Author(s):  
Linzhi Li ◽  
Tianzeng Huang ◽  
Saijun He ◽  
Xing Liu ◽  
Qi Chen ◽  
...  
Keyword(s):  
Glucose Sensor ◽  
Glucose Sensing ◽  
Fabrication Process ◽  
Eggshell Membrane ◽  
Templated Synthesis ◽  
Free Glucose

The fabrication process of the nonenzyme glucose sensing based Cu2+–Cu+/biochar.

Electrochemical gating of CVD graphene–ZnO based tansistor

2021 ◽  
Author(s):  
Lijin George ◽  
Manu Shaji
Keyword(s):  
Cvd Graphene ◽  
Electrochemical Gating
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