Enhanced two dimensional electron gas transport characteristics in Al2O3/AlInN/GaN metal-oxide-semiconductor high-electron-mobility transistors on Si substrate

2015 ◽  
Vol 107 (10) ◽  
pp. 103506 ◽  
Author(s):  
J. J. Freedsman ◽  
A. Watanabe ◽  
Y. Urayama ◽  
T. Egawa
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