AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors with reduced leakage current and enhanced breakdown voltage using aluminum ion implantation

2016 ◽  
Vol 108 (1) ◽  
pp. 013507 ◽  
Author(s):  
Shichuang Sun ◽  
Kai Fu ◽  
Guohao Yu ◽  
Zhili Zhang ◽  
Liang Song ◽  
...  
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